Invention Grant
US06703624B2 Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device
有权
使用多轴电子透镜的多光束曝光装置，会聚有多个电子束的电子透镜以及半导体装置的制造方法
- Patent Title: Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device
- Patent Title (中): 使用多轴电子透镜的多光束曝光装置，会聚有多个电子束的电子透镜以及半导体装置的制造方法
-
Application No.: US09824874Application Date: 2001-04-04
-
Publication No.: US06703624B2Publication Date: 2004-03-09
- Inventor: Shinichi Hamaguchi , Takeshi Haraguchi , Hiroshi Yasuda
- Applicant: Shinichi Hamaguchi , Takeshi Haraguchi , Hiroshi Yasuda
- Priority: JP2000-102619 20000404; JP2000-251885 20000823; JP2000-342660 20001003
- Main IPC: H01J35153
- IPC: H01J35153
Abstract:
An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings operable to converge the electron beams independently of each other, the plurality of lens openings having different shapes.
Public/Granted literature
Information query
