公开(公告)号：US06703624B2

公开(公告)日：2004-03-09

申请号：US09824874

申请日：2001-04-04

Applicant: Shinichi Hamaguchi ,  Takeshi Haraguchi ,  Hiroshi Yasuda

Inventor： Shinichi Hamaguchi ,  Takeshi Haraguchi ,  Hiroshi Yasuda

IPC: H01J35153

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/0635 ,  H01J2237/1205

Abstract: An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings operable to converge the electron beams independently of each other, the plurality of lens openings having different shapes.

Abstract translation: 用于使多个电子束曝光晶片的电子束曝光装置包括具有多个透镜开口的多轴电子透镜，其可操作以彼此独立地会聚电子束，所述多个透镜开口具有不同的形状。