Invention Grant
- Patent Title: Semiconductor device and method of forming a semiconductor device
- Patent Title (中): 半导体装置及半导体装置的形成方法
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Application No.: US09957547Application Date: 2001-09-21
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Publication No.: US06703684B2Publication Date: 2004-03-09
- Inventor: Florin Udrea , Gehan A. J. Amaratunga
- Applicant: Florin Udrea , Gehan A. J. Amaratunga
- Main IPC: H01L2900
- IPC: H01L2900

Abstract:
A power semiconductor device (10) has an active region that includes a drift region (20). At least a portion of the drift region (20) is provided in a membrane (16) which has opposed top and bottom surfaces (15,17). In one embodiment, the top surface (15) of the membrane (16) has electrical terminals connected directly or indirectly thereto to allow a voltage to be applied laterally across the drift region (20). In another embodiment, at least one electrical terminal is connected directly or indirectly to the top surface (15) and at least one electrical terminal is connected directly or indirectly to the bottom surface (17) to allow a voltage to be applied vertically across the drift region (20). In each of these embodiments, the bottom surface (17) of the membrane (16) does not have a semiconductor substrate positioned adjacent thereto.
Public/Granted literature
- US20020041003A1 Semiconductor device and method of forming a semiconductor device Public/Granted day:2002-04-11
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