发明授权
- 专利标题: Lithography laser with beam delivery and beam pointing control
- 专利标题(中): 光束激光器具有光束传递和光束指向控制
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申请号: US10233253申请日: 2002-08-30
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公开(公告)号: US06704339B2公开(公告)日: 2004-03-09
- 发明人: Leonard Lublin , David J. Warkentin , Palash P. Das , Brian C. Klene , R. Kyle Webb , Herve A. Besaucele , Ronald L. Spangler , Richard L. Sandstrom , Alexander I. Ershov , Shahryar Rokni
- 申请人: Leonard Lublin , David J. Warkentin , Palash P. Das , Brian C. Klene , R. Kyle Webb , Herve A. Besaucele , Ronald L. Spangler , Richard L. Sandstrom , Alexander I. Ershov , Shahryar Rokni
- 主分类号: H01S3101
- IPC分类号: H01S3101
摘要:
The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.