公开(公告)号：US06704339B2

公开(公告)日：2004-03-09

申请号：US10233253

申请日：2002-08-30

申请人： Leonard Lublin ,  David J. Warkentin ,  Palash P. Das ,  Brian C. Klene ,  R. Kyle Webb ,  Herve A. Besaucele ,  Ronald L. Spangler ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  Shahryar Rokni

发明人： Leonard Lublin ,  David J. Warkentin ,  Palash P. Das ,  Brian C. Klene ,  R. Kyle Webb ,  Herve A. Besaucele ,  Ronald L. Spangler ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  Shahryar Rokni

IPC分类号： H01S3101

CPC分类号： H01S3/005 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

摘要翻译： 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。 该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

公开(公告)号：US06882674B2

公开(公告)日：2005-04-19

申请号：US10036676

申请日：2001-12-21

申请人： Christian J. Wittak ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  Jerome A. Emilo ,  Clay C. Titus ,  Alex P. Ivaschenko ,  Paolo Zambon ,  Gamaralalage G. Padmabandu ,  Mark S. Branham ,  Sunjay Phatak ,  Raymond F. Cybulski

发明人： Christian J. Wittak ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  Jerome A. Emilo ,  Clay C. Titus ,  Alex P. Ivaschenko ,  Paolo Zambon ,  Gamaralalage G. Padmabandu ,  Mark S. Branham ,  Sunjay Phatak ,  Raymond F. Cybulski

IPC分类号： H01S3/097 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H01S3/23 ,  H01S3/22

CPC分类号： G03F7/70025 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

摘要翻译： 本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。 在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

公开(公告)号：US06539042B2

公开(公告)日：2003-03-25

申请号：US09771789

申请日：2001-01-29

申请人： Shahryar Rokni ,  Xiaojiang J. Pan ,  Eckehard D. Onkels

发明人： Shahryar Rokni ,  Xiaojiang J. Pan ,  Eckehard D. Onkels

IPC分类号： H01S322

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

摘要： The present invention provides an ultra pure purge system for discharge lasers. The LNP, the output coupler, the wavemeter and selected high voltage components are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is filtered and directed to each of the inlet ports. Gas exiting the outlet ports may be directed to flow monitors having alarms so that any loss of purge will be immediately detected. Purge gas may be exhausted or recirculated.

摘要翻译： 本发明提供一种用于放电激光器的超纯净化系统。 LNP，输出耦合器，波形计和选定的高电压部件都包含在密封室中，每个密封腔都具有清洗入口和净化出口。 吹扫气体如N 2被过滤并引导到每个入口端口。 离开出口的气体可以被引导到具有报警器的流量监视器，使得将立即检测到任何清除的损失。 吹扫气体可能被排出或再循环。

公开(公告)号：US06757316B2

公开(公告)日：2004-06-29

申请号：US09854097

申请日：2001-05-11

申请人： Peter C. Newman ,  Thomas P. Duffey ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Vladimir B. Fleurov ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Xiaojiang J. Pan ,  Vladimir Kulgeyko ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov

发明人： Peter C. Newman ,  Thomas P. Duffey ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Vladimir B. Fleurov ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Xiaojiang J. Pan ,  Vladimir Kulgeyko ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov

IPC分类号： H01S322

CPC分类号： H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

摘要翻译： 本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。 在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

公开(公告)号：US06504860B2

公开(公告)日：2003-01-07

申请号：US09837150

申请日：2001-04-18

申请人： Peter C. Newman ,  John Van Doorn ,  Darrel W. Fullen ,  William H. Clopton ,  Shahryar Rokni

发明人： Peter C. Newman ,  John Van Doorn ,  Darrel W. Fullen ,  William H. Clopton ,  Shahryar Rokni

IPC分类号： H01S322

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

摘要： A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.

公开(公告)号：US6028880A

公开(公告)日：2000-02-22

申请号：US109596

申请日：1998-07-02

申请人： Jason R. Carlesi ,  Shahryar Rokni ,  Mengxiong Gong ,  Tom A. Watson ,  Palash P. Das ,  Michael C. Binder ,  Muljadi Tantra ,  David J. Tammadge ,  Daniel G. Patterson

发明人： Jason R. Carlesi ,  Shahryar Rokni ,  Mengxiong Gong ,  Tom A. Watson ,  Palash P. Das ,  Michael C. Binder ,  Muljadi Tantra ,  David J. Tammadge ,  Daniel G. Patterson

IPC分类号： G03F7/20 ,  H01S3/036 ,  H01S3/225

CPC分类号： G03F7/70558 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/225

摘要： An excimer laser system with a fluorine control having a fixed volume inject bottle in which fluorine is injected prior to it being injected into the laser chamber. A manifold and feedback control system is provided to permit precise injection at rates approaching continuous fluorine injection. The system permits the laser to be operated in a small sweet spot as measured by a narrow range of charging voltage.

摘要翻译： 具有氟控制的准分子激光系统具有固定体积的注射瓶，其中在注入氟注入激光室之前注入氟。 提供歧管和反馈控制系统以允许以接近连续氟注入的速率进行精确喷射。 该系统允许激光器在小范围的充电电压测量的小甜点中操作。

公开(公告)号：US5978406A

公开(公告)日：1999-11-02

申请号：US16525

申请日：1998-01-30

申请人： Shahryar Rokni ,  Tom A. Watson ,  David J. Tammadge

发明人： Shahryar Rokni ,  Tom A. Watson ,  David J. Tammadge

IPC分类号： G03F7/20 ,  H01S3/036 ,  H01S3/225

CPC分类号： G03F7/70558 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/225

摘要： An excimer laser with a laser gas containing fluorine in which the fluorine concentration is maintained continuously at or substantially at desired predetermined levels. A real time or substantially real time fluorine monitor provides a feedback signal to a fluorine flow control system which provides continuous fluorine injection flow into the laser chamber to precisely compensate for fluorine depletion and maintain fluorine concentration precisely at desired levels. In a preferred embodiment, fluorine detector which may be a chemical detector periodically measures the fluorine concentration in laser gas discharged from the laser in order to calibrate the real time or substantially real time fluorine monitor. In a second preferred embodiment, the continuous inlet flow is from two gas sources, one containing fluorine, a noble gas and a buffer gas and the other containing only the noble gas and the buffer gas. In a third embodiment, the continuous inlet flow is from a gas source containing fluorine, a noble gas and a buffer gas and filtered gas discharged from the laser.

摘要翻译： 一种具有氟的激光气体的准分子激光，其中氟浓度连续地保持在或基本上保持在期望的预定水平。 实时或基本上实时的氟监测器向氟流量控制系统提供反馈信号，该氟流量控制系统提供连续的氟注入流入激光室以精确补偿氟耗尽，并将氟浓度精确保持在所需水平。 在优选实施例中，可以是化学检测器的氟检测器周期性地测量从激光器排出的激光气体中的氟浓度，以校准实时或实质上实时的氟监测器。 在第二优选实施例中，连续入口流是来自两个气体源，一个​​含氟，惰性气体和缓冲气体，另一个仅含有惰性气体和缓冲气体。 在第三实施例中，连续入口流是从含有氟，惰性气体和缓冲气体的气体源和从激光器排出的过滤气体。