Invention Grant
US06707129B2 Fuse structure integrated wire bonding on the low k interconnect and method for making the same 有权
保险丝结构集成在低k互连上的引线接合及其制造方法

  • Patent Title: Fuse structure integrated wire bonding on the low k interconnect and method for making the same
  • Patent Title (中): 保险丝结构集成在低k互连上的引线接合及其制造方法
  • Application No.: US10020311
    Application Date: 2001-12-18
  • Publication No.: US06707129B2
    Publication Date: 2004-03-16
  • Inventor: Kun-Chih Wang
  • Applicant: Kun-Chih Wang
  • Main IPC: H01L2900
  • IPC: H01L2900
Fuse structure integrated wire bonding on the low k interconnect and method for making the same
Abstract:
A structure for using fuse structure integrated wire bonding on the substrate, and relates to methods for making the same are disclosed, in which an Al-fuse has an extra-etching process pattern by fuse-open mask and has been thinned down from Al-fuse thickness. The Al fuse structure integrated Al wire-bonding pad has two kind of thickness under fuse-open and for the other area. This invention makes the fuse easy to blow without suffering any bondability from wire bonding for packaging.
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