Invention Grant
US06707129B2 Fuse structure integrated wire bonding on the low k interconnect and method for making the same
有权
保险丝结构集成在低k互连上的引线接合及其制造方法
- Patent Title: Fuse structure integrated wire bonding on the low k interconnect and method for making the same
- Patent Title (中): 保险丝结构集成在低k互连上的引线接合及其制造方法
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Application No.: US10020311Application Date: 2001-12-18
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Publication No.: US06707129B2Publication Date: 2004-03-16
- Inventor: Kun-Chih Wang
- Applicant: Kun-Chih Wang
- Main IPC: H01L2900
- IPC: H01L2900

Abstract:
A structure for using fuse structure integrated wire bonding on the substrate, and relates to methods for making the same are disclosed, in which an Al-fuse has an extra-etching process pattern by fuse-open mask and has been thinned down from Al-fuse thickness. The Al fuse structure integrated Al wire-bonding pad has two kind of thickness under fuse-open and for the other area. This invention makes the fuse easy to blow without suffering any bondability from wire bonding for packaging.
Public/Granted literature
- US20030111740A1 Fuse structure integrated wire bonding on the low k interconnect and method for making the same Public/Granted day:2003-06-19
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