发明授权
US06713612B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
有权
磺酰基重氮甲烷，光酸产生剂，抗蚀剂组合物和图案化工艺
- 专利标题： Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
- 专利标题（中）： 磺酰基重氮甲烷，光酸产生剂，抗蚀剂组合物和图案化工艺
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申请号： US10426623申请日： 2003-05-01
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公开(公告)号： US06713612B2公开(公告)日： 2004-03-30
- 发明人: Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
- 申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
- 优先权： JP2002-129681 20020501
- 主分类号： C07C24514
- IPC分类号： C07C24514
摘要：
Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
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