发明授权
US06716322B1 Method and apparatus for controlling film profiles on topographic features
有权
用于控制地形特征上的胶片轮廓的方法和装置
- 专利标题： Method and apparatus for controlling film profiles on topographic features
- 专利标题（中）： 用于控制地形特征上的胶片轮廓的方法和装置
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申请号： US10126928申请日： 2002-04-19
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公开(公告)号： US06716322B1公开(公告)日： 2004-04-06
- 发明人: Hari Hedge , Alan V. Hayes , Boris Druz , Viktor Kanarov , Adrian J. Devasahayam , Emmanuel Lakios
- 申请人： Hari Hedge , Alan V. Hayes , Boris Druz , Viktor Kanarov , Adrian J. Devasahayam , Emmanuel Lakios
- 主分类号： C23C1434
- IPC分类号： C23C1434
摘要：
A deposition system includes a substrate holder supporting a substrate defining at least one topographical feature. In addition, the system includes a deposition plume that is directed toward the substrate. A first profiler mask is positioned between the deposition plume and the substrate, and is shaped so as to reduce inboard/outboard asymmetry in a deposition profile associated with the feature.
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