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    Methods of operating an electromagnet of an ion source
    2.
    发明授权
    Methods of operating an electromagnet of an ion source 有权
    操作离子源电磁铁的方法

    公开(公告)号：US08158016B2

    公开(公告)日：2012-04-17

    申请号：US12037598

    申请日：2008-02-26

    申请人： Alan V. Hayes ,  Rustam Yevtukhov ,  Viktor Kanarov ,  Boris L. Druz

    发明人： Alan V. Hayes ,  Rustam Yevtukhov ,  Viktor Kanarov ,  Boris L. Druz

    IPC分类号： G01L21/30 ,  B44C1/22

    CPC分类号： H01J37/08 ,  H01J27/18 ,  H01J37/3053 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/24542 ,  H01L21/67069

    摘要： Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.

    摘要翻译： 操作离子源的电磁体的方法，用于产生具有可控离子电流密度分布的离子束。 所述方法可以包括在离子源的放电空间中产生等离子体，通过向有效限定等离子体密度分布的电磁体施加电流来产生和放电放电空间中的磁场，从等离子体提取离子束， 测量离子束密度的分布曲线，并将实际分布分布与用于离子束密度的期望分布分布进行比较。 基于比较，可以手动或自动地调节施加到电磁体的电流，以改变放电空间中的磁场，从而改变等离子体密度分布。

    Method and apparatus for surface processing of a substrate
    3.
    发明申请
    Method and apparatus for surface processing of a substrate 有权
    用于表面处理基板的方法和装置

    公开(公告)号：US20050034979A1

    公开(公告)日：2005-02-17

    申请号：US10915745

    申请日：2004-08-11

    申请人： Boris Druz ,  Viktor Kanarov ,  Hariharakeshave Hegde ,  Alan Hayes ,  Emmanuel Lakios

    发明人： Boris Druz ,  Viktor Kanarov ,  Hariharakeshave Hegde ,  Alan Hayes ,  Emmanuel Lakios

    IPC分类号： C23C14/00 ,  C23C14/04 ,  C23C14/22 ,  C23C16/00

    CPC分类号： C23C14/044 ,  C23C14/221

    摘要： Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.

    摘要翻译： 用高能粒子束处理衬底的方法和装置。 光束从源极通过定位在源极和衬底之间的屏蔽件中的矩形孔引导到衬底移动平面中的处理区域。 衬底上的特征与矩形孔的主要尺寸平行排列，并且衬底与孔的主要尺寸正交地移动。 光束在运动过程中通过光圈撞击基板。 衬底可以周期性地旋转大约180°以重新定向相对于矩形孔的主要尺寸的特征。 所得到的处理轮廓关于朝向矩形孔的主要尺寸的特征的侧面对称。

    Method and apparatus for surface processing of a substrate
    4.
    发明授权
    Method and apparatus for surface processing of a substrate 有权
    用于表面处理基板的方法和装置

    公开(公告)号：US07879201B2

    公开(公告)日：2011-02-01

    申请号：US10915745

    申请日：2004-08-11

    申请人： Boris Druz ,  Viktor Kanarov ,  Hariharakeshave S. Hegde ,  Alan V. Hayes ,  Emmanuel Lakios

    发明人： Boris Druz ,  Viktor Kanarov ,  Hariharakeshave S. Hegde ,  Alan V. Hayes ,  Emmanuel Lakios

    IPC分类号： C23C14/00 ,  C23C14/32 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00

    CPC分类号： C23C14/044 ,  C23C14/221

    摘要： Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.

    摘要翻译： 用高能粒子束处理衬底的方法和装置。 光束从源极通过定位在源极和衬底之间的屏蔽件中的矩形孔引导到衬底移动平面中的处理区域。 衬底上的特征与矩形孔的主要尺寸平行排列，并且衬底与孔的主要尺寸正交地移动。 光束在运动过程中通过光圈撞击基板。 衬底可以周期性地旋转大约180°以重新定向相对于矩形孔的主要尺寸的特征。 所得到的处理轮廓关于朝向矩形孔的主要尺寸的特征的侧面对称。

    Charged particle beam extraction and formation apparatus
    6.
    发明授权
    Charged particle beam extraction and formation apparatus 有权
    带电粒子束提取和形成装置

    公开(公告)号：US07414355B2

    公开(公告)日：2008-08-19

    申请号：US11207656

    申请日：2005-08-18

    申请人： Viktor Kanarov ,  Alan V. Hayes ,  Rustam Yevtukhov ,  Daniel Yakovlevitch

    发明人： Viktor Kanarov ,  Alan V. Hayes ,  Rustam Yevtukhov ,  Daniel Yakovlevitch

    IPC分类号： H01J3/14 ,  H01J37/09 ,  H01J40/04

    CPC分类号： H01J27/024 ,  H01J27/022 ,  H01J37/08 ,  H01J37/3053 ,  H01J2237/061 ,  H01J2237/3151

    摘要： A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

    摘要翻译： 带有电荷的粒子装置，具有多个导电半球栅格电极，栅格电极安装在介电安装环中，具有隐藏的区域或区域，以在栅电极和安装环之间形成溅射沉积，以维持栅电极之间的电隔离。 栅格电极通过槽和紧固销安装到安装环上，这些插槽和紧固销允许网格电极和安装环之间的滑动热膨胀和收缩，同时基本上保持网格开口的对准和栅格电极之间的间隔。 不对称的紧固销便于滑动热膨胀同时限制栅格电极。 电接触器通过弹簧加载的滑动触点来提供和维持栅格电极的电位，而基本上不影响栅格电极的热特性。

    METHODS OF OPERATING AN ELECTROMAGNET OF AN ION SOURCE
    7.
    发明申请
    METHODS OF OPERATING AN ELECTROMAGNET OF AN ION SOURCE 有权
    一种离子源的电磁操作方法

    公开(公告)号：US20080179284A1

    公开(公告)日：2008-07-31

    申请号：US12037598

    申请日：2008-02-26

    申请人： Alan V. Hayes ,  Rustam Yevtukhov ,  Viktor Kanarov ,  Boris L. Druz

    发明人： Alan V. Hayes ,  Rustam Yevtukhov ,  Viktor Kanarov ,  Boris L. Druz

    IPC分类号： G01L21/30 ,  B44C1/22

    CPC分类号： H01J37/08 ,  H01J27/18 ,  H01J37/3053 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/24542 ,  H01L21/67069

    摘要： Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.

    摘要翻译： 操作离子源的电磁体的方法，用于产生具有可控离子电流密度分布的离子束。 所述方法可以包括在离子源的放电空间中产生等离子体，通过向有效限定等离子体密度分布的电磁体施加电流来产生和放电放电空间中的磁场，从等离子体提取离子束， 测量离子束密度的分布曲线，并将实际分布分布与用于离子束密度的期望分布分布进行比较。 基于比较，可以手动或自动地调节施加到电磁体的电流，以改变放电空间中的磁场，从而改变等离子体密度分布。

    METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE
    9.
    发明申请
    METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE 审中-公开
    基板表面处理的方法和装置

    公开(公告)号：US20110089022A1

    公开(公告)日：2011-04-21

    申请号：US12977430

    申请日：2010-12-23

    申请人： Boris Druz ,  Viktor Kanarov ,  Hariharakeshave S. Hegde ,  Alan V. Hayes ,  Emmanuel Lakios

    发明人： Boris Druz ,  Viktor Kanarov ,  Hariharakeshave S. Hegde ,  Alan V. Hayes ,  Emmanuel Lakios

    IPC分类号： C23C14/34 ,  C23C14/46 ,  C23C14/35

    CPC分类号： C23C14/044 ,  C23C14/221

    摘要： Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.

    摘要翻译： 用高能粒子束处理衬底的方法和装置。 光束从源极通过定位在源极和衬底之间的屏蔽件中的矩形孔引导到衬底移动平面中的处理区域。 衬底上的特征与矩形孔的主要尺寸平行排列，并且衬底与孔的主要尺寸正交地移动。 光束在运动过程中通过光圈撞击基板。 衬底可以周期性地旋转大约180°以重新定向相对于矩形孔的主要尺寸的特征。 所得到的处理轮廓关于朝向矩形孔的主要尺寸的特征的侧面对称。