Invention Grant
US06717503B2 Coil and coil system for integration into a micro-electronic circuit and microelectronic circuit 有权
线圈和线圈系统集成到微电子电路和微电子电路中

  • Patent Title: Coil and coil system for integration into a micro-electronic circuit and microelectronic circuit
  • Patent Title (中): 线圈和线圈系统集成到微电子电路和微电子电路中
  • Application No.: US10200422
    Application Date: 2002-07-22
  • Publication No.: US06717503B2
    Publication Date: 2004-04-06
  • Inventor: Jörg BertholdDieter SewaldMarc Tiebout
  • Applicant: Jörg BertholdDieter SewaldMarc Tiebout
  • Priority: DE10002377 20000120
  • Main IPC: H01F500
  • IPC: H01F500
Coil and coil system for integration into a micro-electronic circuit and microelectronic circuit
Abstract:
The coil and coil system is provided for integration in a microelecronic circuit. The coil is placed inside an oxide layer of a chip, and the oxide layer is placed on the substrate surface of a substrate. The coil comprises one or more windings, whereby the winding(s) is/are formed by at least segments of two conductor tracks, which are each provided in spatially spaced-apart metalization levels, and by via-contacts which connect these conductor track(s) and/or conductor track segments. In order to be able to produce high-quality coils, a coil is produced with the largest possible coil cross-section, whereby a standard metalization, especially a standard metalization using copper, can, however, be used for producing the oil. To this end, the via contacts are formed from a stack of two ore more via elements arranged one above the other. Parts of the metalization levels can be located between the via elements.
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