发明授权
- 专利标题: Semiconductor device and power amplifier using the same
- 专利标题(中): 半导体器件和功率放大器使用相同
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申请号: US10420764申请日: 2003-04-23
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公开(公告)号: US06724020B2公开(公告)日: 2004-04-20
- 发明人: Hiroyuki Takazawa , Tohru Oka , Isao Ohbu , Yoshinori Imamura
- 申请人: Hiroyuki Takazawa , Tohru Oka , Isao Ohbu , Yoshinori Imamura
- 优先权: JP2000-169050 20000601
- 主分类号: H01L31109
- IPC分类号: H01L31109
摘要:
A semiconductor device comprising a bipolar transistor having an emitter layer consisting of a semiconductor containing indium, and a protective insulating film containing silicon and oxygen which is formed on the surface of the guard ring of the emitter layer, wherein the protective insulating film has a density of oxygen of less than 7×1022 cm−3. This semiconductor device prevents performance deterioration and ensures high performance in a power amplifier.
公开/授权文献
- US20030205719A1 Semiconductor device and power amplifier using the same 公开/授权日:2003-11-06
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