发明授权
US06724068B2 Optical semiconductor device and fabricating method thereof 有权
光半导体器件及其制造方法

  • 专利标题: Optical semiconductor device and fabricating method thereof
  • 专利标题(中): 光半导体器件及其制造方法
  • 申请号: US10104634
    申请日: 2002-03-21
  • 公开(公告)号: US06724068B2
    公开(公告)日: 2004-04-20
  • 发明人: Takayuki Matsuyama
  • 申请人: Takayuki Matsuyama
  • 优先权: JPP2001-097598 20010329; JPP2002-072979 20020315
  • 主分类号: H01L2906
  • IPC分类号: H01L2906
Optical semiconductor device and fabricating method thereof
摘要:
An optical semiconductor device having a low threshold current and easiness of a single transverse mode oscillation is provided. The optical semiconductor device has a low device parasitic capacitance that allows a direct modulation at high speed. The optical semiconductor device comprises a first conduction type substrate, a stripe shaped active layer formed on the first conduction type substrate, a mesa shaped burying layer formed around the active layer and having a larger band gap than that of the active layer, and a groove that electrically isolates the burying layer, wherein the section of the burying layer is in an inverse trapezoid shape of which the upper base side is longer than the lower base side.
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