发明授权
- 专利标题： Apparatus for producing electron source
- 专利标题（中）： 用于生产电子源的装置
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申请号： US09788411申请日： 2001-02-21
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公开(公告)号： US06726520B2公开(公告)日： 2004-04-27
- 发明人: Toshihiko Takeda , Masaru Kamio , Masataka Yamashita , Yasue Sato , Hitoshi Oda , Keisuke Yamamoto , Miki Tamura , Hideshi Kawasaki , Kazuhiro Jindai
- 申请人： Toshihiko Takeda , Masaru Kamio , Masataka Yamashita , Yasue Sato , Hitoshi Oda , Keisuke Yamamoto , Miki Tamura , Hideshi Kawasaki , Kazuhiro Jindai
- 优先权： JP10-253037 19980907; JP11-047805 19990225; JP11-048134 19990225; JP11-247930 19990901
- 主分类号： H01B902
- IPC分类号： H01B902
摘要：
This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate (10) having a conductor (11), a vessel (12) which has a gas inlet port (15) and a gas exhaust port (16) and covers a partial region of the surface of the substrate (10); a gas inlet unit (24) connected to the gas inlet port (15) to introduce gas into the vessel, an exhaust unit (26) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit (32) for applying a voltage to the conductor.
公开/授权文献
- US20010036682A1 Method and apparatus for producing electron source 公开/授权日：2001-11-01
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