发明授权
- 专利标题: X-ray mask, and exposure method and apparatus using the same
- 专利标题(中): X射线掩模和使用其的曝光方法和装置
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申请号: US09970826申请日: 2001-10-05
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公开(公告)号: US06728332B2公开(公告)日: 2004-04-27
- 发明人: Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
- 申请人: Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
- 优先权: JP8-123594 19960517; JP8-133516 19960528
- 主分类号: G21K300
- IPC分类号: G21K300
摘要:
An exposure method for transferring a pattern of a mask onto a member to be exposed. The method includes the steps of making preparations for exposure while a protection cover is attached to the mask, executing alignment between the member to be exposed and the mask while the protection cover is detached from the mask, and executing exposure with X-rays while the protection cover is detached from the mask.
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