Invention Grant
US06728586B2 Microelectronic fabrication production control method and system providing enhanced microelectronic fabrication facility utilization flexibility 失效
微电子制造生产控制方法和系统提供增强的微电子制造设备利用灵活性

  • Patent Title: Microelectronic fabrication production control method and system providing enhanced microelectronic fabrication facility utilization flexibility
  • Patent Title (中): 微电子制造生产控制方法和系统提供增强的微电子制造设备利用灵活性
  • Application No.: US10047329
    Application Date: 2002-01-14
  • Publication No.: US06728586B2
    Publication Date: 2004-04-27
  • Inventor: Chao-Hsin ChangCheng-Hsi WenEdwin Liou
  • Applicant: Chao-Hsin ChangCheng-Hsi WenEdwin Liou
  • Main IPC: G06F1900
  • IPC: G06F1900
Microelectronic fabrication production control method and system providing enhanced microelectronic fabrication facility utilization flexibility
Abstract:
Within both a method for controlling microelectronic fabrication production and a system for controlling microelectronic fabrication production there is developed and evaluated for a plurality of microelectronic fabrication facilities a plurality of demand, allocation and output management plans prior to assigning and entering within at least one microelectronic fabrication facility a microelectronic fabrication order. The development and evaluation of the plurality of demand, allocation and output management plans provides for enhanced flexibility when assigning and entering the microelectronic fabrication order.
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