Invention Grant
- Patent Title: Microelectronic fabrication production control method and system providing enhanced microelectronic fabrication facility utilization flexibility
- Patent Title (中): 微电子制造生产控制方法和系统提供增强的微电子制造设备利用灵活性
-
Application No.: US10047329Application Date: 2002-01-14
-
Publication No.: US06728586B2Publication Date: 2004-04-27
- Inventor: Chao-Hsin Chang , Cheng-Hsi Wen , Edwin Liou
- Applicant: Chao-Hsin Chang , Cheng-Hsi Wen , Edwin Liou
- Main IPC: G06F1900
- IPC: G06F1900

Abstract:
Within both a method for controlling microelectronic fabrication production and a system for controlling microelectronic fabrication production there is developed and evaluated for a plurality of microelectronic fabrication facilities a plurality of demand, allocation and output management plans prior to assigning and entering within at least one microelectronic fabrication facility a microelectronic fabrication order. The development and evaluation of the plurality of demand, allocation and output management plans provides for enhanced flexibility when assigning and entering the microelectronic fabrication order.
Public/Granted literature
Information query