发明授权
- 专利标题: Memory element and method for fabricating a memory element
- 专利标题(中): 用于制造存储元件的存储元件和方法
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申请号: US10275598申请日: 2003-04-21
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公开(公告)号: US06730930B2公开(公告)日: 2004-05-04
- 发明人: Franz Hofmann , Richard Johannes Luyken , Wolfgang Rösner
- 申请人: Franz Hofmann , Richard Johannes Luyken , Wolfgang Rösner
- 主分类号: H01L3524
- IPC分类号: H01L3524
摘要:
A memory element with organic material comprises two metallized layers, arranged one on top of the other, with first lines and second lines which are arranged to intersect with each other. A channel is formed at the intersections between the first line and the second line, which overlaps the first line partially and completely overlaps the second line. The channels are filled with a filling material, the electrical conductivity of which may be altered by an applied electrical voltage.
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