发明授权
- 专利标题: Apparatus for holding an object to be processed
- 专利标题(中): 用于保持待处理物体的装置
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申请号: US10345294申请日: 2003-01-16
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公开(公告)号: US06733624B2公开(公告)日: 2004-05-11
- 发明人: Akira Koshiishi , Shinji Himori
- 申请人: Akira Koshiishi , Shinji Himori
- 优先权: JP2000-216552 20000717
- 主分类号: H01L21302
- IPC分类号: H01L21302
摘要:
An apparatus for holding an object to be processed, according to this invention is mounted in a plasma processing apparatus and includes a convex-shaped holder main body, first dielectric film, and second dielectric film. The holder main body has a holding portion which holds an object to be processed placed on it and a flange formed on the peripheral portion of the holding portion to fit with a focus ring. The first dielectric film attracts the object to be processed placed on the holding portion to the holder main body by a Coulomb force. The second dielectric film attracts the focus ring fitted on the flange to the holder main body by an attracting force larger than that of the first dielectric film using a Johnson-Rahbek force. The electrostatic attracting force of the focus ring for the holder main body is increased, so that the cooling effect is increased. A change in plasma processing characteristics over time in the vicinity of the focus ring can be eliminated, and the entire surface of the object to be processed can be processed uniformly.
公开/授权文献
- US20030106647A1 Apparatus for holding an object to be processed 公开/授权日:2003-06-12
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