Invention Grant
- Patent Title: Vacuum measurement device
- Patent Title (中): 真空测量装置
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Application No.: US09940407Application Date: 2001-08-27
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Publication No.: US06734969B2Publication Date: 2004-05-11
- Inventor: Michael Abraham , Matthias Hampel
- Applicant: Michael Abraham , Matthias Hampel
- Priority: DE10042123 20000828
- Main IPC: G01J400
- IPC: G01J400

Abstract:
To carry out measurements in the vacuum, for example for quality control in the production of semiconductors, conventional stand alone measuring machines are installed. They are very cost, space and time intensive. To enable a process oriented measurement under optimal conditions, a device with a two part case is proposed that can be moved in a vacuum chamber, whereby one part of the case projects into the vacuum chamber and the other part of the case is located outside the vacuum chamber. The case can receive a measurement system. In addition, an adjusting device, engaging with the case, and a counterpull device, engaging with the second part of the case, are provided.
Public/Granted literature
- US20020101591A1 Vacuum measurement device Public/Granted day:2002-08-01
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