Invention Grant
- Patent Title: High power gas discharge laser with line narrowing unit
- Patent Title (中): 大功率气体放电激光器与线条变窄单元
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Application No.: US09451407Application Date: 1999-11-30
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Publication No.: US06735236B2Publication Date: 2004-05-11
- Inventor: Raymond F. Cybulski , Alexander I. Ershov , Eckehard D. Onkels , Palash P. Das , Danilo K. Richardson , Jesse D. Buck
- Applicant: Raymond F. Cybulski , Alexander I. Ershov , Eckehard D. Onkels , Palash P. Das , Danilo K. Richardson , Jesse D. Buck
- Main IPC: H01S308
- IPC: H01S308

Abstract:
A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating. In preferred embodiments a stream of gas is directed across the face of the grating. In other embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas and in other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
Public/Granted literature
- US20020006147A1 HIGH POWER GAS DISCHARGE LASER WITH LINE NARROWING UNIT Public/Granted day:2002-01-17
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