发明授权
US06740556B1 Method for forming EPROM with low leakage 有权
低泄漏形成EPROM的方法

Method for forming EPROM with low leakage
摘要:
A method for forming an electrically programmable read-only memory(EPROM) includes forming a first p+ doped region, a second p+ doped region, and a third p+ doped region on an N-well, forming a control gate between the first p+ doped region and the second p+ doped region, and forming a p+ floating gate between the second p+ doped region and the third p+ doped region.
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