发明授权
- 专利标题: Method for forming EPROM with low leakage
- 专利标题(中): 低泄漏形成EPROM的方法
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申请号: US10249075申请日: 2003-03-14
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公开(公告)号: US06740556B1公开(公告)日: 2004-05-25
- 发明人: Ching-Hsiang Hsu , Chih-Hsun Chu , Ming-Chou Ho , Shih-Jye Shen
- 申请人: Ching-Hsiang Hsu , Chih-Hsun Chu , Ming-Chou Ho , Shih-Jye Shen
- 主分类号: H01L218247
- IPC分类号: H01L218247
摘要:
A method for forming an electrically programmable read-only memory(EPROM) includes forming a first p+ doped region, a second p+ doped region, and a third p+ doped region on an N-well, forming a control gate between the first p+ doped region and the second p+ doped region, and forming a p+ floating gate between the second p+ doped region and the third p+ doped region.
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