Invention Grant
- Patent Title: Method of analyzing silicon-germanium alloys and apparatus for manufacturing semiconductor layer structures with silicon-germanium alloy layers
- Patent Title (中): 硅 - 锗合金分析方法和硅 - 锗合金层半导体层结构制造装置
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Application No.: US10247269Application Date: 2002-09-18
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Publication No.: US06744501B2Publication Date: 2004-06-01
- Inventor: Manfred Klose
- Applicant: Manfred Klose
- Priority: DE10146826 20010919
- Main IPC: G01J344
- IPC: G01J344

Abstract:
In order to improve a method of analyzing Si—Ge alloys, with which a Raman spectrum of a sample is recorded and Raman frequencies and Raman intensities of the Si—Si modes and the Si—Ge modes of the alloy layer are evaluated, such that any strain and any Ge portion in an alloy layer can be ascertained in a simple and as exact a manner as possible, it is provided for one or more spectrum contributions lying outside the Si—Ge modes and the Si—Si modes to be evaluated as oscillation modes.
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