发明授权
US06749103B1 Low temperature sputter target bonding method and target assemblies produced thereby 有权
由此制造低温溅射靶接合方法和目标组件

  • 专利标题: Low temperature sputter target bonding method and target assemblies produced thereby
  • 专利标题(中): 由此制造低温溅射靶接合方法和目标组件
  • 申请号: US09720347
    申请日: 2000-12-21
  • 公开(公告)号: US06749103B1
    公开(公告)日: 2004-06-15
  • 发明人: Eugene Y. IvanovHarry W. Conard
  • 申请人: Eugene Y. IvanovHarry W. Conard
  • 主分类号: B23K3102
  • IPC分类号: B23K3102
Low temperature sputter target bonding method and target assemblies produced thereby
摘要:
A low temperature target and backing plate bonding process and assemblies made thereby. A plurality of projections are formed in the harder member of the assembly. The assembly is bonded by conventional techniques around the peripheral assembly boundaries. The assembly is then pressure consolidated at low temperature so that the projections, circumscribed by the bonded zone, penetrate into the softer member promoting the formation of metal to metal cold diffusion type bonds.
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