Invention Grant
US06749975B2 Method of utilizing color photoresist to form black matrix and spacers on a control circuit substrate
有权
在控制电路基板上利用彩色光致抗蚀剂形成黑矩阵和间隔物的方法
- Patent Title: Method of utilizing color photoresist to form black matrix and spacers on a control circuit substrate
- Patent Title (中): 在控制电路基板上利用彩色光致抗蚀剂形成黑矩阵和间隔物的方法
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Application No.: US10430750Application Date: 2003-05-06
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Publication No.: US06749975B2Publication Date: 2004-06-15
- Inventor: Jia-Shyong Cheng , Yu-Fang Wang
- Applicant: Jia-Shyong Cheng , Yu-Fang Wang
- Priority: TW91133898A 20021120
- Main IPC: G02B520
- IPC: G02B520

Abstract:
A method of utilizing color photoresist to form black matrix and spacers on a control circuit substrate is described. Utilizing the character of the red and the blue photoresist having a non-overlapping transmittance region in the visible light region, a black matrixes consisting of overlapping red and blue photoresist on control devices are used to prevent the photo current occurring in the off state of the control devices. In addition, three different color photoresist plus another-color photoresist are overlapped to form spacers on metal lines.
Public/Granted literature
- US20040096756A1 METHOD OF UTILIZING COLOR PHOTORESIST TO FORM BLACK MATRIX AND SPACERS ON A CONTROL CIRCUIT SUBSTRATE Public/Granted day:2004-05-20
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