发明授权
- 专利标题: Substrate processing apparatus
- 专利标题(中): 基板加工装置
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申请号: US10427049申请日: 2003-04-30
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公开(公告)号: US06752543B2公开(公告)日: 2004-06-22
- 发明人: Yoshiteru Fukutomi , Katsushi Yoshioka , Yukihiko Inagaki
- 申请人: Yoshiteru Fukutomi , Katsushi Yoshioka , Yukihiko Inagaki
- 优先权: JPP2002-149347 20020523
- 主分类号: G03D500
- IPC分类号: G03D500
摘要:
A manifold communicatively connects a plurality of coating processing units with an air conditioning unit. The manifold is formed by branching a common pipe into a plurality of distributing pipes. The air conditioning unit performs temperature control to set air passing through a branch point of the manifold to a temperature slightly lower than a target temperature in processing units. Secondary heaters secondarily heat air passing through joints between the distributing pipes and the processing units to the target temperature thereby supplying accurately temperature-controlled air to processing parts. Air from the air conditioning unit is diverted thereby suppressing the height of the overall apparatus. Thus, a substrate processing apparatus capable of inhibiting the height of the overall apparatus from remarkable increase also when vertically stacking processing parts in multiple stages and supplying temperature-controlled air to the processing parts with sufficient accuracy.
公开/授权文献
- US20030217695A1 Substrate processing apparatus 公开/授权日:2003-11-27
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