发明授权
- 专利标题： Positive resist composition
- 专利标题（中）： 正抗蚀剂组成
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申请号： US09953888申请日： 2001-09-18
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公开(公告)号： US06756179B2公开(公告)日： 2004-06-29
- 发明人: Toru Fujimori , Kunihiko Kodama , Shinichi Kanna , Fumiyuki Nishiyama
- 申请人： Toru Fujimori , Kunihiko Kodama , Shinichi Kanna , Fumiyuki Nishiyama
- 优先权： JPP2000-283823 20000919
- 主分类号： G03C173
- IPC分类号： G03C173
摘要：
A positive resist composition comprises (A) a resin capable of decomposing by the action of an acid to increase solubility in an alkali developer, and (B) a compound capable of generating an aromatic sulfonic acid substituted with at least one group containing a fluorine atom upon irradiation with one of an actinic ray and radiation.
公开/授权文献
- US20020058200A1 Positive resist composition 公开/授权日：2002-05-16
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