发明授权
- 专利标题: Method for lithographic processing on molecular monolayer and multilayer thin films
- 专利标题(中): 分子单层和多层薄膜的平版印刷加工方法
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申请号: US10015063申请日: 2001-12-11
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公开(公告)号: US06756296B2公开(公告)日: 2004-06-29
- 发明人: James R. Heath , Charles P. Collier , Yi Luo , Erica DeIonno , Patricia A. Beck
- 申请人: James R. Heath , Charles P. Collier , Yi Luo , Erica DeIonno , Patricia A. Beck
- 主分类号: H01L214763
- IPC分类号: H01L214763
摘要:
Methods for making electronic devices where a molecular monolayer or multilayer is sandwiched between top and bottom electrodes at electrode intersections. The molecular layer has an electrical characteristic such as bistable switching. A layer of electrically conductive material is used to protect the molecular layer during formation of the top electrode pattern. The electrically conductive material remains sandwiched between the top and bottom electrodes at the electrode intersections in the final electronic device.
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