发明授权
- 专利标题: Air platen for leading edge and trailing edge control
- 专利标题(中): 用于前缘和后缘控制的气压盘
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申请号: US10037452申请日: 2001-12-20
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公开(公告)号: US06761626B2公开(公告)日: 2004-07-13
- 发明人: Anthony de la Llera , Xuyen Pham , Cangshan Xu , David Wei , Tony Luong
- 申请人: Anthony de la Llera , Xuyen Pham , Cangshan Xu , David Wei , Tony Luong
- 主分类号: B24B722
- IPC分类号: B24B722
摘要:
An air platen assembly is described and includes a platen that has a plurality of concentric rings. Each of the rings has a plurality of openings in order to provide a cushion of air to a CMP belt. At least one of the rings extends beyond an outer edge of a wafer to be planarized by the CMP belt. A support is attached with the platen and has a plurality of air ports for pressurized air to pass to the rings of the platen. A gasket is positioned between the support and the platen and has a plurality of cutouts that align with the openings and the air ports. A base is also included and supports the support.
公开/授权文献
- US20030119433A1 Air platen for leading edge and trailing edge control 公开/授权日:2003-06-26
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