发明授权
- 专利标题: Exposure apparatus and device manufacturing method
- 专利标题(中): 曝光装置和装置制造方法
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申请号: US09948796申请日: 2001-09-10
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公开(公告)号: US06762820B2公开(公告)日: 2004-07-13
- 发明人: Kenji Udagawa , Tomoyuki Yoshida , Michinori Hashimoto , Fumio Karibe
- 申请人: Kenji Udagawa , Tomoyuki Yoshida , Michinori Hashimoto , Fumio Karibe
- 优先权: JP2000-274050 20000908; JP2001-268742 20010905
- 主分类号: G03B2752
- IPC分类号: G03B2752
摘要:
A chemical filter, which removes chemical pollutants from gas and controls temperature fluctuation of the gas before and after passing through the filter to within a predetermined range, is arranged in a portion of a ventilation path extending from a machine chamber housing at least a portion of an air conditioning unit to a main body chamber housing an exposure apparatus main body. Accordingly, the atmosphere around the exposure apparatus main body arranged downstream of the chemical filter is kept chemically clean, and the temperature fluctuation of the gas, of which the temperature is set to a target temperature by the air conditioner, after passing through the chemical filter is limited. That is, occurrence of a problem such as an illumination reduction caused by tarnish of optical members and an increase of the temperature fluctuation amount of the gas supplied into the main body chamber can be effectively limited.
公开/授权文献
- US20020036760A1 Exposure apparatus and device manufacturing method 公开/授权日:2002-03-28
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