Invention Grant
- Patent Title: Injection seeded F2 laser with pre-injection filter
- Patent Title (中): 用预注射过滤器注入F2激光
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Application No.: US09829475Application Date: 2001-04-09
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Publication No.: US06765945B2Publication Date: 2004-07-20
- Inventor: Richard L. Sandstrom , William N. Partlo , Eckehard D. Onkels
- Applicant: Richard L. Sandstrom , William N. Partlo , Eckehard D. Onkels
- Main IPC: H01S322
- IPC: H01S322

Abstract:
A narrow band F2 laser system useful for integrated circuit lithography. An output beam from a first F2 laser gain medium is filtered with a pre-gain filter to produce a seed beam having a bandwidth of about 0.1 pm or less. The seed beam is amplified in a power gain stage which includes a second F2 laser gain medium. The output beam of the system is a pulsed laser beam with a full width half maximum band width of about 0.1 pm or less with pulse energy in excess of about 5 mJ. In a preferred embodiment the pre-gain filter includes a wavelength monitor which permits feedback control over the centerline wavelength so that the pre-gain filter optics can be adjusted to ensure that the desired bandwidth range is injected into the power gain stage.
Public/Granted literature
- US20020064202A1 Injection seeded F2 laser with pre-injection filter Public/Granted day:2002-05-30
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