发明授权
US06768118B2 Electron beam monitoring sensor and electron beam monitoring method
有权
电子束监测传感器和电子束监测方法
- 专利标题： Electron beam monitoring sensor and electron beam monitoring method
- 专利标题（中）： 电子束监测传感器和电子束监测方法
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申请号： US10350188申请日： 2003-01-24
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公开(公告)号： US06768118B2公开(公告)日： 2004-07-27
- 发明人: Yoshinori Nakayama , Yasunari Sohda , Hiroya Ohta , Norio Saitou , Masato Muraki , Masaki Takakuwa
- 申请人： Yoshinori Nakayama , Yasunari Sohda , Hiroya Ohta , Norio Saitou , Masato Muraki , Masaki Takakuwa
- 优先权： JP2002-231208 20020808
- 主分类号： H01J326
- IPC分类号： H01J326
摘要：
The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same. In a Faraday cup for electron beam monitoring, tantalum or a heavy metal material having an atomic number larger than that of tantalum is used to provide a Faraday cup construction having a high aspect ratio. The micro Faraday cup permits electron beam monitoring having less beam leak to a high acceleration electron beam.
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