公开(公告)号：US08827966B2

公开(公告)日：2014-09-09

申请号：US12988686

申请日：2008-04-30

申请人： Norio Saitou

发明人： Norio Saitou

IPC分类号： A61M35/00 ,  A61N1/30 ,  A61F13/00 ,  A61F13/02 ,  A61B17/00

CPC分类号： A61H1/008 ,  A61B5/0053 ,  A61B5/4827 ,  A61F13/023 ,  A61F13/0273 ,  A61F2013/00919 ,  A61F2013/00936

摘要： A therapeutic patch for treating pain capable of compressing a tender area up to a boundary thereof and/or an entire induration with metallic grains or crushed stones by a treatment method in accordance with a classification determined after clarifying a site of pain by pressing a skin with a pressing bar or fingers (first to fourth fingers) to classify the cause of pain, thereby finding the presence of a geographical tender area and/or the presence of an induration on a skin as the cause of pain.

摘要翻译： 一种用于治疗疼痛的治疗补片，其能够通过根据通过按压皮肤澄清疼痛部位而确定的分类后的处理方法将金属颗粒或粉碎石块压缩至其边界的嫩嫩区域和/或整体硬结 按压杆或手指（第一至第四指）来分类疼痛的原因，从而发现皮肤上存在地理标记区域和/或硬结的存在作为疼痛的原因。

公开(公告)号：US06667486B2

公开(公告)日：2003-12-23

申请号：US10219769

申请日：2002-08-16

申请人： Hiroya Ohta ,  Yasunari Sohda ,  Norio Saitou ,  Haruo Yoda ,  Yoshikiyo Yui ,  Shin'ichi Hashimoto

发明人： Hiroya Ohta ,  Yasunari Sohda ,  Norio Saitou ,  Haruo Yoda ,  Yoshikiyo Yui ,  Shin'ichi Hashimoto

IPC分类号： H01J3708

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/304 ,  H01J37/3177

摘要： The present invention provides a high-precision and high-speed electron beam exposure technique which corrects the position of each beam in a multi-beam exposure method without using a deflection array and a huge and high-precision driving circuit. In an electron beam exposure method for forming a desired pattern onto a specimen by independently controlling emission and scanning of a plurality of electron beams, a deviation between a pattern formed by each of the plurality of electron beams and the desired pattern is controlled by shifting the position of pattern data of the pattern formed by each of the plurality of electron beams.

摘要翻译： 本发明提供一种高精度和高速电子束曝光技术，其不使用偏转阵列和巨大且高精度的驱动电路来校正多光束曝光方法中的每个光束的位置。 在通过独立地控制多个电子束的发射和扫描来形成期望图案到电子束的电子束曝光方法中，由多个电子束中的每一个形成的图案与期望的图案之间的偏差通过使 由多个电子束中的每一个形成的图案的图案数据的位置。

公开(公告)号：US5757409A

公开(公告)日：1998-05-26

申请号：US644089

申请日：1996-05-10

申请人： Yoshihiko Okamoto ,  Haruo Yoda ,  Ikuo Takada ,  Yukinobu Shibata ,  Akira Hirakawa ,  Norio Saitou ,  Shinji Okazaki ,  Fumio Murai

发明人： Yoshihiko Okamoto ,  Haruo Yoda ,  Ikuo Takada ,  Yukinobu Shibata ,  Akira Hirakawa ,  Norio Saitou ,  Shinji Okazaki ,  Fumio Murai

IPC分类号： G03F7/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  B41J2/435

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31766 ,  H01J2237/31776

摘要： Selective pattern exposure with high reliability is made possible by a desired pattern of repeated pattern and a non-repeated pattern. Exposure technology is obtained to enable improvement of preparation efficiency of pattern data and to secure inspection of an aperture pattern. With the invention, an electron beam is used as focused beam, and a pattern exposure apparatus of a batch transfer system for transferring repeated pattern and non-repeated pattern of plural graphics of a semiconductor integrated circuit or the like comprises an EB drawing section for controlling the beam and irradiating beam onto a sample, a control I/O section, a drawing control section and a data storage section. In the EB drawing section, a semiconductor wafer is mounted on a platform, and in the path of the electron beam from the electron beam source to the stage, a first mask, a blanking electrode, an electron lens, a first deflector, a second deflector, a second mask and a third deflector are installed.

公开(公告)号：US5650631A

公开(公告)日：1997-07-22

申请号：US470592

申请日：1995-06-07

申请人： Yasunari Sohda ,  Masahide Okumura ,  Yasuhiro Someda ,  Hidetoshi Satoh ,  Yoshinori Nakayama ,  Norio Saitou

发明人： Yasunari Sohda ,  Masahide Okumura ,  Yasuhiro Someda ,  Hidetoshi Satoh ,  Yoshinori Nakayama ,  Norio Saitou

IPC分类号： G21K5/04 ,  G03F7/20 ,  H01J37/04 ,  H01J37/09 ,  H01J37/147 ,  H01J37/305 ,  H01L21/027 ,  H01J37/30

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J2237/0435 ,  H01J2237/31774 ,  H01J2237/31776

摘要： A blanking array is used for controlling an electron beam in an electron beam writing system. Electrodes in the array are formed in parallel and two sets of the parallel electrodes, orthogonal to one another, are used for dividing the electron beam into a plurality of individual exposure areas. The sets of parallel electrodes can be formed in one array by a wire mesh or in two separate arrays spaced closely together or farther apart at different focal point positions. The electrodes are provided to extend across an aperture, such as a square or triangular aperture. For a triangular aperture, the electrodes are made parallel to the hypotenuse of the triangle. The writing patterns are formed by combining the exposure areas. Control of each exposure area is realized by applying opposite polarity voltage to adjacent electrodes in order to deflect the portion of the beam passing between the adjacent electrodes. The deflected beam portions are blocked by a downstream aperture that permits the non-deflected electron beam portions to pass through for forming the patterns to be written.

摘要翻译： 消隐阵列用于控制电子束写入系统中的电子束。 阵列中的电极平行地形成，并且彼此正交的两组平行电极被用于将电子束分成多个单独的曝光区域。 这些平行电极组可以通过丝网形成一个阵列，或者可以在不同的焦点位置处彼此间隔开或更远的两个分离的阵列中形成。 电极被设置成延伸穿过诸如正方形或三角形孔的孔。 对于三角形孔，电极与三角形的斜边平行。 通过组合曝光区域形成书写图案。 通过对相邻的电极施加相反极性的电压来实现对每个曝光区域的控制，以便偏转通过相邻电极的光束的部分。 偏转的光束部分被允许非偏转的电子束部分通过以形成待写入的图案的下游孔阻挡。

公开(公告)号：US4820928A

公开(公告)日：1989-04-11

申请号：US106499

申请日：1987-10-09

申请人： Mitsuo Ooyama ,  Kimiaki Ando ,  Yoshio Kawamura ,  Norio Saitou ,  Takanori Simura ,  Hiroyuki Kohida

发明人： Mitsuo Ooyama ,  Kimiaki Ando ,  Yoshio Kawamura ,  Norio Saitou ,  Takanori Simura ,  Hiroyuki Kohida

IPC分类号： G02B5/18 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/31762

摘要： A lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, including a framing pattern memory for storing therein closed framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for scanning the framing pattern memory having stored therein closed framing lines of the pattern to be drawn and for generating a beam deflection address for drawing the pattern and a beam blanking control signal.

摘要翻译： 其中控制诸如电子束或离子束的带电粒子扫描样品的期望区域并由此绘制图案的光刻设备，包括用于存储图案的闭合框线的框架图案存储器 以点图像的形式绘制的帧图案生成器，用于以点图像的形式将要绘制的图案的成帧线写入所述成帧图案存储器的成像模式生成器，以及用于扫描已存储在其中的成帧模式存储器的光栅扫描电路闭合 要绘制的图案的成帧线和用于产生用于绘制图案的光束偏转地址和光束消隐控制信号。

公开(公告)号：US4577111A

公开(公告)日：1986-03-18

申请号：US516091

申请日：1983-07-22

申请人： Norio Saitou ,  Susumu Ozasa ,  Takashi Matsuzaka

发明人： Norio Saitou ,  Susumu Ozasa ,  Takashi Matsuzaka

IPC分类号： G03F7/20 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30 ,  H01J37/26

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3174 ,  H01L21/30 ,  H01J2237/1505 ,  H01J2237/152 ,  H01J2237/30472 ,  H01J2237/31776

摘要： An apparatus for electron beam lithography comprises at least one mask equipped with a polygonal aperture to be subjected to an electron beam from an electron beam generator, an electron lens system for demagnifying and imaging the polygonal aperture of the mask, and a solenoid coil for electron beam rotation adjustment placed between the mask and the final-stage electron lens.

摘要翻译： 用于电子束光刻的装置包括至少一个掩模，其配备有要经受来自电子束发生器的电子束的多边形孔，用于对掩模的多边形孔径进行缩小和成像的电子透镜系统和用于电子的螺线管线圈 光束旋转调节放置在掩模和终末电子透镜之间。

公开(公告)号：US20110046580A1

公开(公告)日：2011-02-24

申请号：US12988686

申请日：2008-04-30

申请人： Norio Saitou

发明人： Norio Saitou

IPC分类号： A61M35/00

CPC分类号： A61H1/008 ,  A61B5/0053 ,  A61B5/4827 ,  A61F13/023 ,  A61F13/0273 ,  A61F2013/00919 ,  A61F2013/00936

摘要： The present invention provides a therapeutic patch for treating pain capable of compressing a tender area up to a boundary thereof and/or an entire induration with metallic grains or crushed stones by a treatment method in accordance with a classification determined after clarifying a site of pain by pressing a skin with a pressing bar or fingers (first to fourth fingers) to classify the cause of pain, thereby finding the presence of a geographical tender area and/or the presence of an induration on a skin as the cause of pain.

摘要翻译： 本发明提供了一种用于治疗疼痛的治疗补片，所述治疗补片能够通过根据在通过以下方式确定疼痛部位之后确定的分类中确定的分类后，通过治疗方法压缩直到其边界的嫩嫩区域和/或整个硬化的金属颗粒或碎石块 用按压杆或手指（第一至第四手指）按压皮肤以分类疼痛的原因，从而发现皮肤上存在地理招标区域和/或硬结的存在作为疼痛的原因。

公开(公告)号：US07094867B2

公开(公告)日：2006-08-22

申请号：US10497525

申请日：2002-11-29

申请人： Michihisa Miyahara ,  Norio Saitou ,  Mitsuhiro Matsuzaki

发明人： Michihisa Miyahara ,  Norio Saitou ,  Mitsuhiro Matsuzaki

IPC分类号： C08F6/00

CPC分类号： C08G75/0281 ,  C08G75/0213 ,  C08G75/0254

摘要： A polymerizate slurry obtained through a reaction of an alkali sulfide source and an aromatic dihalide compound in an organic polar solvent and comprising polyarylene sulfide particles, a by-produced alkali metal salt and the polar organic solvent, is continuously contacted countercurrently with a washing liquid, thereby continuously and efficiently recovering washed polyarylene sulfide particles. Furthermore, the by-produced alkali metal salt is removed, and the polar organic solvent is recovered, efficiently.

摘要翻译： 通过碱金属硫化物源和芳族二卤化物在有机极性溶剂中反应并且包含聚芳硫醚颗粒，副产物碱金属盐和极性有机溶剂而获得的聚合物浆料与洗涤液体逆流地连续接触， 从而连续有效地回收洗涤的聚芳硫醚颗粒。 此外，除去副产的碱金属盐，有效地回收极性有机溶剂。

公开(公告)号：US20050029473A1

公开(公告)日：2005-02-10

申请号：US10909300

申请日：2004-08-03

申请人： Masato Muraki ,  Yoshinori Nakayama ,  Hiroya Ohta ,  Haruo Yoda ,  Norio Saitou

发明人： Masato Muraki ,  Yoshinori Nakayama ,  Hiroya Ohta ,  Haruo Yoda ,  Norio Saitou

IPC分类号： G03F7/20 ,  H01J37/04 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  G01K1/08 ,  H01J3/14

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/317

摘要： A charged particle beam exposure apparatus which exposes a substrate using a plurality of charged particle beams comprises a first measurement member for making the plurality of charged particle beams come incident and measuring a total current value of the charged particle beams, and a second measurement member for making the plurality of charged particle beams come incident and multiplying electrons of each of the incident charged particle beams, thereby measuring a relative value of a current of each of the charged particle beams.

摘要翻译： 使用多个带电粒子束曝光基板的带电粒子束曝光装置包括使多个带电粒子束入射的第一测量部件和测量带电粒子束的总电流值，以及第二测量部件， 使多个带电粒子束入射并乘以每个入射带电粒子束的电子，从而测量每个带电粒子束的电流的相对值。

公开(公告)号：US06730916B1

公开(公告)日：2004-05-04

申请号：US09691234

申请日：2000-10-19

申请人： Hiroshi Tsuji ,  Mitsuru Inoue ,  Norio Saitou ,  Yasuhiro Someda ,  Yoshimasa Fukushima

发明人： Hiroshi Tsuji ,  Mitsuru Inoue ,  Norio Saitou ,  Yasuhiro Someda ,  Yoshimasa Fukushima

IPC分类号： H01J3720

CPC分类号： H01J37/09 ,  H01J37/20 ,  H01J2237/3175 ,  H02K11/01 ,  H02K41/03

摘要： An electron beam lithography apparatus of the present invention prevents the electron beam trajectory from being affected by a leakage magnetic field from a permanent magnet which is used as a sample stage guide/driving mechanism. In this electron beam lithography apparatus, an air bearing guide is used as a sample stage guide mechanism, and the stage posture is held by attracting the stage floating on a surface plate to the surface plate side by the permanent magnet. To avoid the leakage magnetic field from the permanent magnet from affecting the electron beam irradiation position on the sample, the permanent magnet is magnetically shielded by a shield member. In addition, to reduce variations in magnetic field above the sample, which are generated when the shield member moves in a leakage magnetic field from the electron lens, another shield member is arranged under the electron lens.

摘要翻译： 本发明的电子束光刻设备防止电子束轨迹受到用作样品台引导/驱动机构的永久磁铁的泄漏磁场的影响。 在该电子束光刻装置中，使用空气轴承引导件作为样品台引导机构，通过永久磁铁吸引在表面板上浮动到台板侧的台架来保持台阶姿态。 为了避免来自永磁体的泄漏磁场影响样品上的电子束照射位置，永磁体被屏蔽部件磁屏蔽。 此外，为了减小当屏蔽部件在来自电子透镜的泄漏磁场中移动时产生的样品上方的磁场的变化，在电子透镜下方设置有另一个屏蔽部件。