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US06768158B2 Flash memory element and manufacturing method thereof 失效
闪存元件及其制造方法

  • Patent Title: Flash memory element and manufacturing method thereof
  • Patent Title (中): 闪存元件及其制造方法
  • Application No.: US10234501
    Application Date: 2002-09-04
  • Publication No.: US06768158B2
    Publication Date: 2004-07-27
  • Inventor: Jong Ho LeeHyung Cheol Shin
  • Applicant: Jong Ho LeeHyung Cheol Shin
  • Priority: KR2001-54055 20010904
  • Main IPC: H01L29788
  • IPC: H01L29788
Flash memory element and manufacturing method thereof
Abstract:
The present invention provides a flash memory element and its manufacturing method having improved overall memory characteristics by constituting a double-gate element for improving the scaling down characteristic of flash memory element. With the above double-gate flash memory structure, a flash memory element in the present invention improves the scaling down characteristic and the programming and retention characteristic of a flash memory element.
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