Invention Grant
- Patent Title: Flash memory element and manufacturing method thereof
- Patent Title (中): 闪存元件及其制造方法
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Application No.: US10234501Application Date: 2002-09-04
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Publication No.: US06768158B2Publication Date: 2004-07-27
- Inventor: Jong Ho Lee , Hyung Cheol Shin
- Applicant: Jong Ho Lee , Hyung Cheol Shin
- Priority: KR2001-54055 20010904
- Main IPC: H01L29788
- IPC: H01L29788

Abstract:
The present invention provides a flash memory element and its manufacturing method having improved overall memory characteristics by constituting a double-gate element for improving the scaling down characteristic of flash memory element. With the above double-gate flash memory structure, a flash memory element in the present invention improves the scaling down characteristic and the programming and retention characteristic of a flash memory element.
Public/Granted literature
- US20030042531A1 Flash memory element and manufacturing method thereof Public/Granted day:2003-03-06
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