Invention Grant
US06768857B2 Method for manufacturing an optical device with a defined total device stress
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具有规定的总装置应力的光学装置的制造方法
- Patent Title: Method for manufacturing an optical device with a defined total device stress
- Patent Title (中): 具有规定的总装置应力的光学装置的制造方法
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Application No.: US10141665Application Date: 2002-05-07
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Publication No.: US06768857B2Publication Date: 2004-07-27
- Inventor: Gian-Luca Bona , Roland Germann , Ingmar Meijer , Bert Offrein , Huub L Salemink , Dorothea W Wiesmann
- Applicant: Gian-Luca Bona , Roland Germann , Ingmar Meijer , Bert Offrein , Huub L Salemink , Dorothea W Wiesmann
- Priority: EP01810463 20010511
- Main IPC: G02B610
- IPC: G02B610

Abstract:
A method for manufacturing an optical device with a defined total device stress, birefringence and optical polarization dependence is disclosed. The method comprises first providing a tower cladding layer of an amorphous material with a first refractive index and then providing above the lower cladding layer an upper cladding layer of an amorphous material with a second refractive index. An optical waveguide core comprising an amorphous material having a third refractive index (larger than the first refractive index and the second refractive index) is provided between the lower and the upper cladding layers. The upper cladding layer is thermally annealed by keeping the upper cladding layer at a first temperature, then raising the temperature to a second temperature, maintaining the second temperature for an annealing time period, and lowering the temperature to a third temperature, after which the temperature is lowered to a fourth temperature.
Public/Granted literature
- US20020194876A1 Method for manufacturing an optical device with a defined total device stress Public/Granted day:2002-12-26
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