发明授权
- 专利标题: Semiconductor-device inspecting apparatus and a method for manufacturing the same
- 专利标题(中): 半导体装置检查装置及其制造方法
-
申请号: US10316828申请日: 2002-12-12
-
公开(公告)号: US06774654B2公开(公告)日: 2004-08-10
- 发明人: Masatoshi Kanamaru , Yoshishige Endo , Takanorr Aono , Ryuji Kohno , Toshio Miyatake , Hideyuki Aoki , Naoto Ban
- 申请人: Masatoshi Kanamaru , Yoshishige Endo , Takanorr Aono , Ryuji Kohno , Toshio Miyatake , Hideyuki Aoki , Naoto Ban
- 优先权: JP2000-274997 20000906
- 主分类号: G01R3102
- IPC分类号: G01R3102
摘要:
A semiconductor inspecting apparatus having a plurality of electrical connection boards arranged in the inspecting apparatus and a plurality of probes respectively provided on a plurality of beams formed on a first board of said plurality of electrical connection boards, the probes being adapted to be individually brought into contact with a plurality of electrode pads of a semiconductor device for inspection, so as to inspect the semiconductor device while establishing electrical connection therebetween. A one-end supported beam is used as each of the beams, and each of the probes is formed at a portion shifted in a rectangular direction to a center line of a longitudinal direction of the one-end supported beam.
公开/授权文献
信息查询