发明授权
- 专利标题： Method of manufacturing an ultra high saturation moment soft magnetic thin film
- 专利标题（中）： 制造超高饱和度软磁薄膜的方法
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申请号： US09859363申请日： 2001-05-18
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公开(公告)号： US06776891B2公开(公告)日： 2004-08-17
- 发明人: Chaopeng Chen , Kevin Lin , Jei Wei Chang
- 申请人： Chaopeng Chen , Kevin Lin , Jei Wei Chang
- 主分类号： C25D356
- IPC分类号： C25D356
摘要：
A method for forming a plated magnetic thin film of high saturation magnetization and low coercivity having the general form Co100−a−bFeaMb, where M can be Mo, Cr, W, Ni or Rh, which is suitable for use in magnetic recording heads that write on narrow trackwidth, high coercivity media. The plating method includes four current application processes: direct current, pulsed current, pulse reversed current and conditioned pulse reversed current.
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