发明授权
- 专利标题: Semiconductor wafer
- 专利标题(中): 半导体晶圆
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申请号: US09492761申请日: 2000-01-27
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公开(公告)号: US06777820B2公开(公告)日: 2004-08-17
- 发明人: Teiichirou Chiba , Etsurou Satou , Jun Tajika
- 申请人: Teiichirou Chiba , Etsurou Satou , Jun Tajika
- 优先权: JP11-019737 19990128
- 主分类号: H01L23544
- IPC分类号: H01L23544
摘要:
To provide a semiconductor wafer having dot marks produced by irradiating laser beam capable of selecting a marking region capable of reading and writing marks in a state in which the marks hardly vanish and the semiconductor wafer is contained in a wafer cassette, inscribing information of an identification number or electric properties in the region and grasping past history by a unit of the wafer in processing steps or semiconductor fabrication steps thereafter, a very small dot mark is formed by irradiating laser having a diameter of 1 through 13 &mgr;m on an inner wall face of a notch (1) formed on an outer peripheral face of a semiconductor wafer (W), particularly on an inclined face of its peripheral edge.
公开/授权文献
- US20030015806A1 Semiconductor wafer 公开/授权日:2003-01-23
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