Invention Grant
- Patent Title: Power supply apparatus for generating plasma
- Patent Title (中): 用于产生等离子体的电源装置
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Application No.: US10292580Application Date: 2002-11-13
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Publication No.: US06777881B2Publication Date: 2004-08-17
- Inventor: Itsuo Yuzurihara , Masahiro Kikuchi , Toyoaki Suenaga , Yoichi Ishikawa
- Applicant: Itsuo Yuzurihara , Masahiro Kikuchi , Toyoaki Suenaga , Yoichi Ishikawa
- Priority: JP2002-233942 20020809
- Main IPC: H01J724
- IPC: H01J724

Abstract:
A power supply apparatus for generating a plasma for supplying a high-frequency power to a plasma generating device which is a load. The power supply apparatus comprises: a DC power supply; a power conversion circuit which comprises an amplifier circuit of D-class comprising a plurality of switching elements, and which converts a DC power output of the DC power supply to a high-frequency power to output; and a load impedance conversion circuit which converts a load impedance to a predetermined delayed load, wherein the power supply apparatus is adapted to supply the high-frequency power output from the power conversion circuit to a plasma generating device through the load impedance conversion circuit.
Public/Granted literature
- US20040032212A1 Power supply apparatus for generating plasma Public/Granted day:2004-02-19
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