发明授权
- 专利标题： Method of manufacturing electron-emitting device, electron source and image-forming apparatus, and apparatus of manufacturing electron source
- 专利标题（中）： 制造电子发射器件，电子源和图像形成装置的方法以及制造电子源的装置
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申请号： US10112720申请日： 2002-04-02
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公开(公告)号： US06780073B2公开(公告)日： 2004-08-24
- 发明人: Miki Tamura , Toshikazu Ohnishi , Kazuhiro Jindai
- 申请人： Miki Tamura , Toshikazu Ohnishi , Kazuhiro Jindai
- 优先权： JP11-047803 19990225; JP2000-047625 20000224
- 主分类号： H01J900
- IPC分类号： H01J900
摘要：
A method of manufacturing an electron-emitting device includes a process for forming a pair of electric conductors spaced from each other on a substrate, and an activation process for forming a film of carbon or a carbon compound on at least one of the pair of electric conductors. The activation process is sequentially performed within plural containers having different atmospheres.