发明授权
US06780242B2 Method for manufacturing high-quality manganese-doped semiconductor nanocrystals 失效
制造高品质锰掺杂半导体纳米晶体的方法

  • 专利标题: Method for manufacturing high-quality manganese-doped semiconductor nanocrystals
  • 专利标题(中): 制造高品质锰掺杂半导体纳米晶体的方法
  • 申请号: US09811674
    申请日: 2001-03-20
  • 公开(公告)号: US06780242B2
    公开(公告)日: 2004-08-24
  • 发明人: David J. Norris
  • 申请人: David J. Norris
  • 主分类号: C30B2500
  • IPC分类号: C30B2500
Method for manufacturing high-quality manganese-doped semiconductor nanocrystals
摘要:
A method for manufacturing high-quality Mn-doped nanocrystals is provided. The method generally comprises the steps of: (a) combining an organometallic manganese precursor with an organometallic Group II precursor and an organometallic Group VI precursor to provide a precursor mixture; (b) diluting the precursor mixture with a dilution solvent to provide an injection mixture; (c) heating a coordinating solvent; (d) stirring the heated coordinating solvent; and (e) injecting the injection mixture into the heated coordinating solvent while the heated coordinating solvent is being stirred. The invention is particularly useful for manufacturing high-quality, Mn-doped zinc selenide (ZnSe) nanocrystals, high-quality, Mn-doped zinc sulfide (ZnS) nanocrystals, and high-quality, Mn-doped zinc telluride (ZnTe) nanocrystals.
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