发明授权
US06781123B2 Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus 有权
带电粒子束控制元件,带电粒子束控制元件的制造方法和带电粒子束装置

  • 专利标题: Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus
  • 专利标题(中): 带电粒子束控制元件,带电粒子束控制元件的制造方法和带电粒子束装置
  • 申请号: US10396559
    申请日: 2003-03-26
  • 公开(公告)号: US06781123B2
    公开(公告)日: 2004-08-24
  • 发明人: Yukiharu Okubo
  • 申请人: Yukiharu Okubo
  • 优先权: JPP1999-296842 19991019
  • 主分类号: H01J3700
  • IPC分类号: H01J3700
Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus
摘要:
An inspection method using an electron beam. Emitted charged particles from an electron gun located inside a primary column are accelerated to form a primary beam. A cross section of the primary beam is shaped a desired shape by a primary optical system located inside the primary column. A trajectory of the primary beam is deflected using a primary deflector located inside the primary column. A sample is illuminated using the primary beam, the sample being on a stage to which a retarding voltage is applied. At least one of secondary electrons, reflected electrons or backwardly scattered electrons that are emerging from the sample on the stage are accelerated toward a second column to form a secondary beam. A trajectory of the secondary beam is deflected using a secondary deflector located inside the secondary column. The secondary beam is guided to a detector located inside the secondary column.
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