发明授权
- 专利标题: Nonvolatile semiconductor memory device and method for fabricating the same
- 专利标题(中): 非易失性半导体存储器件及其制造方法
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申请号: US10382508申请日: 2003-03-07
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公开(公告)号: US06784040B2公开(公告)日: 2004-08-31
- 发明人: Masataka Kusumi , Fumihiko Noro , Hiromasa Fujimoto , Akihiro Kamada , Shinji Odanaka , Seiki Ogura
- 申请人: Masataka Kusumi , Fumihiko Noro , Hiromasa Fujimoto , Akihiro Kamada , Shinji Odanaka , Seiki Ogura
- 优先权: JP2000-200579 20000703
- 主分类号: H01L29788
- IPC分类号: H01L29788
摘要:
A nonvolatile semiconductor memory device has a protective insulating film deposited on each of the side surfaces of a control gate electrode to protect the control gate electrode during the formation of a floating gate electrode, the floating gate electrode opposed to one of the side surfaces of the control gate electrode with the protective insulating film interposed therebetween so as to be capacitively coupled to the control gate electrode, a tunnel insulating film formed between the floating gate electrode and the semiconductor substrate, a drain region formed in a region of the semiconductor substrate containing a portion underlying the floating gate electrode, and a source region formed in a region of the semiconductor substrate opposite to the drain region relative to the control gate electrode.
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