Invention Grant
- Patent Title: Coating composition for the production of insulating thin films
- Patent Title (中): 用于生产绝缘薄膜的涂料组合物
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Application No.: US10240789Application Date: 2002-10-04
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Publication No.: US06787191B2Publication Date: 2004-09-07
- Inventor: Hiroyuki Hanahata , Toru Araki , Mikihiko Nakamura
- Applicant: Hiroyuki Hanahata , Toru Araki , Mikihiko Nakamura
- Priority: JP2000-102447 20000404
- Main IPC: B05D302
- IPC: B05D302

Abstract:
Disclosed is a coating composition for use in producing an insulating thin film, comprising: (A) at least one silica precursor comprised of at least one compound selected from the group consisting of an alkoxysilane and a hydrolysis product thereof; (B) at least one organic polymer; (C) water; (D) at least one alcohol; and optionally (E) an organic solvent for a mixture of the components (A), (B), (C) and (D); wherein the weight ratio (WR) of the water (C) to the at least one silica precursor (A) satisfies the formula 0.01
Public/Granted literature
- US20030099844A1 Coating composition for the production of insulating thin films Public/Granted day:2003-05-29
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