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US06787416B2 Non volatile embedded memory with poly protection layer 有权
非易失性嵌入式存储器,具有多层保护层

Non volatile embedded memory with poly protection layer
Abstract:
The present invention includes devices and methods to form non-volatile memory cells and peripheral devices, with reduced damage to the electron trapping layer and, optionally, reduced thermal exposure during CMOS processing. Particular aspects of the present invention are described in the claims, specification and drawings.
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