发明授权
US06788093B2 Methodology and apparatus using real-time optical signal for wafer-level device dielectrical reliability studies 有权
使用实时光信号进行晶圆级器件介电可靠性研究的方法与设备

Methodology and apparatus using real-time optical signal for wafer-level device dielectrical reliability studies
摘要:
A method and structure tests devices on a wafer by applying an electrical bias to the devices and simultaneously monitoring emitted light from all of the devices. The emitted light indicates locations of defective devices and records time-based images of the emitted light across the wafer.
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