- 专利标题: Lithographic projection apparatus and device manufacturing method
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申请号: US10686813申请日: 2003-10-17
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公开(公告)号: US06791665B2公开(公告)日: 2004-09-14
- 发明人: Ralph Kurt , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 申请人: Ralph Kurt , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 优先权: EP02079329 20021018
- 主分类号: G03B2742
- IPC分类号: G03B2742
摘要:
A lithographic projection apparatus is provided wherein an object situated in a pulsed beam of radiation has an electrode in its vicinity and a voltage source connected either to the electrode or to the object. This configuration can provide a negative voltage pulse to the object relative to the electrode. The beam of radiation and the voltage pulse from the voltage source are provided in phase or out of phase. In this way, the object is shielded against secondary electrons generated by radiation beam illumination.