Invention Grant
- Patent Title: Method for inspecting defect and system therefor
- Patent Title (中): 检查缺陷的方法和系统
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Application No.: US09794532Application Date: 2001-02-27
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Publication No.: US06792359B2Publication Date: 2004-09-14
- Inventor: Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
- Applicant: Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
- Priority: JP2000-231352 20020726
- Main IPC: G01B528
- IPC: G01B528

Abstract:
Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.
Public/Granted literature
- US20020035435A1 Method for inspecting defect and system therefor Public/Granted day:2002-03-21
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