公开(公告)号：US20130107255A1

公开(公告)日：2013-05-02

申请号：US13702684

申请日：2011-05-31

Applicant: Shigeru Matsui ,  Daisuke Kurimoto

Inventor： Shigeru Matsui ,  Daisuke Kurimoto

IPC: G01J3/10

CPC classification number: G01J3/10 ,  G01J3/12 ,  G01J3/2803 ,  G01J3/42 ,  G01N21/255 ,  G01N21/31

Abstract: Disclosed is a spectrophotometer capable of achieving a good signal-to-noise ratio by improving the use efficiency of the amount of light emitted from a Xe flash lamp or other intermittent light source. Light having a desired wavelength is selected from the light emitted from the Xe flash lamp (1), which is a single light source having a wide wavelength range, allowed to pass through a sample (7), detected by a photodetector (21, 22), and supplied to a low-pass filter (24) in a signal processing circuit (23). The duration of the waveform of a signal output from the photodetector (21, 22) is extended by the low-pass filter (24), which has a time constant equivalent to the elapsed time required for the intensity of the light emitted from the Xe flash lamp (1) to decrease from a peak value to a half value and acts as delay means or other duration extension means. The signal having a waveform whose duration is extended is supplied to a computer (30) through an amplifier (25) and an analog-to-digital conversion circuit (26). As the signal having the waveform whose duration is extended can be used, it is possible to enhance the use efficiency of the total amount of emitted light and optimize the effect of signal-to-noise ratio improvement.

Abstract translation: 公开了一种分光光度计，其能够通过提高从Xe闪光灯或其它间歇光源发射的光量的使用效率来获得良好的信噪比。 从具有宽波长范围的单个光源的Xe闪光灯（1）发出的光被选择为允许通过样品（7）的光，由光电检测器（21,22）检测到的光 ），并提供给信号处理电路（23）中的低通滤波器（24）。 从光电检测器（21,22）输出的信号的波形的持续时间由低通滤波器（24）延长，该低通滤波器具有等于从Xe发射的光的强度所需的经过时间的时间常数 闪光灯（1）从峰值减小到半值，并作为延迟装置或其他持续时间延长装置。 具有延长其持续时间的波形的信号通过放大器（25）和模拟 - 数字转换电路（26）提供给计算机（30）。 由于可以使用其持续时间延长的波形的信号，所以可以提高发光总量的使用效率并优化信噪比改善的效果。

公开(公告)号：US08246803B2

公开(公告)日：2012-08-21

申请号：US11654683

申请日：2007-01-18

Applicant: Motohiro Yamazaki ,  Ryoji Inaba ,  Satoshi Takahashi ,  Shigeru Matsui

Inventor： Motohiro Yamazaki ,  Ryoji Inaba ,  Satoshi Takahashi ,  Shigeru Matsui

IPC: G01N27/453

CPC classification number: G01N27/44721

Abstract: An object of the present invention is to provide a capillary electrophoresis apparatus in which simultaneity can be ensured between sensitivity and data acquisition to decrease a pull-up signal while spectral data acquisition is eliminated in each capillary exchange. The invention relates to a capillary electrophoresis apparatus characterized in that a multi-bandpass filter is provided in an optical detection system. In one aspect of the invention, a signal detection area of a two-dimensional detector is divided into plural regions corresponding to wavelength transmission regions of the multi-bandpass filter. An integrated value of the fluorescence spectrum signal is determined in the region including a fluorescence spectrum peak of an analysis sample in the plural regions. The analysis is performed with the integrated value.

Abstract translation: 本发明的目的是提供一种毛细管电泳装置，其中可以在灵敏度和数据采集之间确保同时性，以减少上拉信号，同时在每个毛细管交换中消除光谱数据采集。 本发明涉及一种毛细管电泳装置，其特征在于在光学检测系统中提供多带通滤波器。 在本发明的一个方面，二维检测器的信号检测区域被分成与多带通滤波器的波长透射区域对应的多个区域。 在包括多个区域中的分析样品的荧光光谱峰的区域中确定荧光光谱信号的积分值。 分析用积分值进行。

公开(公告)号：US08243263B2

公开(公告)日：2012-08-14

申请号：US13167298

申请日：2011-06-23

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.

Abstract translation: 在常规污染物颗粒/缺陷检查方法中，如果照明光束的照度被保持在不对样品造成热损伤的预定上限值以下，则检测灵敏度和检查速度与 彼此难以提高检测灵敏度和检测速度之一而不牺牲另一方或同时改善两者。 本发明提供了一种改进的光学检查方法和改进的光学检查装置，其中使用脉冲激光器作为光源，并且激光束通量被分割成多个激光束，其被给予不同的时间延迟以形成 多个照明点。 通过使用每个照明点的发光开始定时信号来隔离并检测来自每个照明点的散射光信号。

公开(公告)号：US20120176611A1

公开(公告)日：2012-07-12

申请号：US13425335

申请日：2012-03-20

Applicant: SHIGERU MATSUI

Inventor： SHIGERU MATSUI

IPC: G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

Abstract translation: 能够获取各散射方位角的散射光强度分布信息，高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜，所以不需要用于夹持透镜周边的支撑件，并且有效开口面积不会降低。 设置多个方位检测光学系统，并且可以通过掩埋整个周边来检测所有方位角处的反射光，而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

公开(公告)号：US20110134418A1

公开(公告)日：2011-06-09

申请号：US13058081

申请日：2009-07-15

Applicant: Shigeru Matsui ,  Mizuki Oku

Inventor： Shigeru Matsui ,  Mizuki Oku

IPC: G01N21/88

CPC classification number: G01N21/93 ,  G01N21/94 ,  G01N21/9501

Abstract: A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected.

Abstract translation: 表面检查装置可以通过使用较小粒径的PSL来检查较小的缺陷。 然而，PSL的粒径受到限制。 因此，在传统的表面检查装置中，没有考虑如何检查在半导体制造步骤的检查中在不久的将来需要的PSL中未设置的这种小粒径的缺陷 。 本发明具有用于产生光的光源装置，其模拟由检查对象散射，衍射或反射的光的波长，光强度，时间依赖性变化和光的偏振中的至少一个 并且光被输入到表面检查装置的光电检测器。 可以检查较小的缺陷。

公开(公告)号：US07872742B2

公开(公告)日：2011-01-18

申请号：US12690987

申请日：2010-01-21

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

Abstract translation: 能够获取各散射方位角的散射光强度分布信息，高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜，所以不需要用于夹持透镜周边的支撑件，并且有效开口面积不会降低。 设置多个方位检测光学系统，并且可以通过掩埋整个周边来检测所有方位角处的反射光，而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

公开(公告)号：US07853068B2

公开(公告)日：2010-12-14

申请号：US12216642

申请日：2008-07-09

Applicant: Shigeru Matsui ,  Katsuya Suzuki

Inventor： Shigeru Matsui ,  Katsuya Suzuki

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US20100118310A1

公开(公告)日：2010-05-13

申请号：US12690987

申请日：2010-01-21

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/94 ,  G01N21/47

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

Abstract translation: 能够获取各散射方位角的散射光强度分布信息，高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜，所以不需要用于夹持透镜周边的支撑件，并且有效开口面积不会降低。 设置多个方位检测光学系统，并且可以通过掩埋整个周边来检测所有方位角处的反射光，而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

公开(公告)号：US07616805B2

公开(公告)日：2009-11-10

申请号：US12249328

申请日：2008-10-10

Applicant: Shigeru Matsui ,  Katsuya Suzuki

Inventor： Shigeru Matsui ,  Katsuya Suzuki

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US07602482B2

公开(公告)日：2009-10-13

申请号：US11798805

申请日：2007-05-17

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8861

Abstract: An optical inspection apparatus irradiates a light beam onto the outer surface of an object to be inspected, in the form of an illumination spot having an illumination intensity which is higher in the outer peripheral part of the object to be inspected than in the inner peripheral part thereof while uniformly maintains a temperature rise caused by the irradiation of the light beam, over the outer surface of the object to be inspected, in order to prevent the effective entire signal value of a scattered light signal from lowering, without lowering the linear speed of a movable stage for the object to be inspected in the outer peripheral part of the object to be inspected, thereby it is possible to prevent lowering of the detectability for a foreign matter or a defect, for preventing lowering of inspection throughput.

Abstract translation: 光学检查装置将光束照射到被检查物体的外周部的照明强度比要检查对象的外周部的照明强度高于内周部的照明光斑的形状 同时在被检查物体的外表面上均匀地保持由光束照射引起的温度升高，以防止散射光信号的有效整体信号值降低，而不会降低线性速度 在待检查物体的外周部分中可检测物体的可移动台，从而可以防止异物或缺陷的可检测性的降低，以防止检查吞吐量的降低。