发明授权
- 专利标题: Wafer processing apparatus having wafer mapping function
- 专利标题(中): 具有晶片映射功能的晶片处理装置
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申请号: US10712040申请日: 2003-11-14
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公开(公告)号: US06795202B2公开(公告)日: 2004-09-21
- 发明人: Jun Emoto , Takeshi Kagaya , Kazuo Yamazaki
- 申请人: Jun Emoto , Takeshi Kagaya , Kazuo Yamazaki
- 优先权: JP2002-331868 20021115
- 主分类号: G01B1128
- IPC分类号: G01B1128
摘要:
If a plurality of wafers are placed on each shelf of a rack in a pod, some problems will arise in processing processes. In addition, in some apparatus for detecting wafers, driving means having a not so high stability in the speed such as an air-operated cylinder is used for moving the sensor, in order to make the structure simple. In the case that detection is performed while the sensor is moved by such driving means, errors becomes large and it is difficult to detect wafers accurately. The present invention provides a wafer processing apparatus provided with a transmissive wafer detection sensor, a dog having index means and a transmissive sensor for the dog. The wafer processing apparatus calculates the ratio of the duration time of a signal from the transmissive wafer detection sensor and the duration time of a signal from the transmissive sensor for the dog corresponding to the index means and compares the ratio with a threshold value set in advance to determine the number of wafers.
公开/授权文献
- US20040144933A1 Wafer processing apparatus having wafer mapping function 公开/授权日:2004-07-29
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