发明授权
US06797443B2 Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device 失效
聚焦监测方法,聚焦监测装置以及制造半导体器件的方法

  • 专利标题: Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device
  • 专利标题(中): 聚焦监测方法,聚焦监测装置以及制造半导体器件的方法
  • 申请号: US09986084
    申请日: 2001-11-07
  • 公开(公告)号: US06797443B2
    公开(公告)日: 2004-09-28
  • 发明人: Shuji NakaoYuki MiyamotoNaohisa Tamada
  • 申请人: Shuji NakaoYuki MiyamotoNaohisa Tamada
  • 优先权: JP2001-191757 20010625
  • 主分类号: G03F900
  • IPC分类号: G03F900
Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device
摘要:
Non-telecentric illuminating light obtained by controlling the shape of an opening of an illumination aperture is directed onto a photomask, and a characteristic such that an image of a pattern of the photomask formed by the non-telecentric illumination moves in the direction perpendicular to an optical axis when an image-forming plane is moved in the direction of the optical axis, to perform focus monitoring. This eliminates the need for a special photomask, so that inexpensive and highly precise focus monitoring method, focus monitoring apparatus, and a method of manufacturing a semiconductor device can be obtained.
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