公开(公告)号：US06890692B2

公开(公告)日：2005-05-10

申请号：US10860244

申请日：2004-06-04

申请人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada ,  Shinroku Maejima

发明人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada ,  Shinroku Maejima

IPC分类号： G03F1/00 ,  G03F1/38 ,  G03F1/44 ,  G03F1/68 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F7/70641 ,  G03F1/44 ,  G03F1/50 ,  G06K7/0095

摘要： A photomask for focus monitoring of the present invention is provided with a substrate that allows the exposure light to pass through and a unit mask structure for focus monitoring. Unit mask structure for focus monitoring has two patterns, and that are formed on the surface of substrate and a light blocking film that has a rear surface pattern that is formed on the rear surface of substrate for substantially differentiating the incident directions of the exposure light that enters two patterns, and for position measurement. When the dimension of rear surface pattern is L and the wavelength of the exposure light is λ, L/λ is 10, or greater.

摘要翻译： 本发明的用于聚焦监视的光掩模具有允许曝光光通过的基板和用于聚焦监视的单元掩模结构。 用于焦点监测的单元掩模结构具有两种图案，并且形成在基板的表面上，并且具有形成在基板的后表面上的背面图案的遮光膜，用于基本上区分曝光光的入射方向， 进入两种模式，并进行位置测量。 当背面图案的尺寸为L且曝光光的波长为λ时，L /λ为10以上。

公开(公告)号：US06797443B2

公开(公告)日：2004-09-28

申请号：US09986084

申请日：2001-11-07

申请人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada

发明人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada

IPC分类号： G03F900

CPC分类号： G03F7/70066 ,  G02B7/04 ,  G02B27/40 ,  G03F7/70641

摘要： Non-telecentric illuminating light obtained by controlling the shape of an opening of an illumination aperture is directed onto a photomask, and a characteristic such that an image of a pattern of the photomask formed by the non-telecentric illumination moves in the direction perpendicular to an optical axis when an image-forming plane is moved in the direction of the optical axis, to perform focus monitoring. This eliminates the need for a special photomask, so that inexpensive and highly precise focus monitoring method, focus monitoring apparatus, and a method of manufacturing a semiconductor device can be obtained.

摘要翻译： 通过控制照明孔的开口的形状而获得的非远心照明光被引导到光掩模上，并且具有使得由非远心照明形成的光掩模的图案的图像沿垂直于 当成像平面在光轴方向上移动时进行光轴执行聚焦监视。 这就消除了对特殊光掩模的需要，从而可以获得廉价且高精度的聚焦监视方法，聚焦监视装置和半导体装置的制造方法。

公开(公告)号：US06764794B2

公开(公告)日：2004-07-20

申请号：US10115246

申请日：2002-04-04

申请人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada ,  Shinroku Maejima

发明人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada ,  Shinroku Maejima

IPC分类号： G03F900

CPC分类号： G03F7/70641 ,  G03F1/44 ,  G03F1/50 ,  G06K7/0095

摘要： A photomask for focus monitoring of the present invention is provided with a substrate that allows the exposure light to pass through and a unit mask structure for focus monitoring. Unit mask structure for focus monitoring has two patterns, and that are formed on the surface of substrate and a light blocking film that has a rear surface pattern that is formed on the rear surface of substrate for substantially differentiating the incident directions of the exposure light that enters two patterns, and for position measurement. When the dimension of rear surface pattern is L and the wavelength of the exposure light is &lgr;, L/&lgr; is 10, or greater.

摘要翻译： 本发明的用于聚焦监视的光掩模具有允许曝光光通过的基板和用于聚焦监视的单元掩模结构。 用于焦点监测的单元掩模结构具有两种图案，并且形成在基板的表面上，并且具有形成在基板的后表面上的背面图案的遮光膜，用于基本上区分曝光光的入射方向， 进入两种模式，并进行位置测量。 当背面图案的尺寸为L且曝光光的波长为λ时，L /λ为10以上。

公开(公告)号：US5868560A

公开(公告)日：1999-02-09

申请号：US940946

申请日：1997-09-30

申请人： Naohisa Tamada ,  Toshihide Kawachi ,  Yuki Miyamoto

发明人： Naohisa Tamada ,  Toshihide Kawachi ,  Yuki Miyamoto

IPC分类号： G03F1/42 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70591 ,  G03F7/70633

摘要： A reticle that allows deviation in rotation and magnification of an exposure region detected just using a wafer subjected to exposure and development without having to provide an underlying pattern, a pattern transferred using such a reticle, and a correction method are achieved. A first measurement pattern is provided on a dicing line pattern of the X axis direction. Also, a second measurement pattern is formed on a line of extension of the first measurement pattern in the Y axis direction. Similarly, a third measurement pattern is formed on the dicing line pattern in the Y axis direction. A fourth measurement pattern is provided corresponding to the third measurement pattern.

摘要翻译： 实现了掩模版，其允许仅使用经受曝光和显影的晶片检测到的曝光区域的旋转偏移和放大率，而不必提供下面的图案，使用这种掩模版转印的图案和校正方法。 在X轴方向的切割线图案上设置第一测量图案。 此外，在Y轴方向上的第一测量图案的延伸线上形成第二测量图案。 类似地，在切割线图案上沿Y轴方向形成第三测量图案。 对应于第三测量图案提供第四测量图案。

公开(公告)号：US06811939B2

公开(公告)日：2004-11-02

申请号：US10126607

申请日：2002-04-22

申请人： Shuji Nakao ,  Yuki Miyamoto ,  Shinroku Maejima

发明人： Shuji Nakao ,  Yuki Miyamoto ,  Shinroku Maejima

IPC分类号： G03F900

CPC分类号： G02B7/28

摘要： A focus monitoring method of the invention is characterized by transferring the pattern of a photo mask for phase shift focus monitor onto a photoresist on a semiconductor substrate by using modified illumination. Photo mask for phase shift focus monitor has first and second light transmitting portions which are adjacent to each other while sandwiching a shielding pattern, and is constructed so that a phase difference other than 180 degrees occurs between exposure light passed through the first light transmitting portion and exposure light passed through the second light transmitting portion. Consequently, a focus monitoring method, a focus monitor system, and a semiconductor fabricating method with high detection sensitivity in the z direction and which do not require changing of an illumination aperture can be achieved.

摘要翻译： 本发明的聚焦监视方法的特征在于通过使用改进的照明将用于相移聚焦监视器的光掩模的图案转印到半导体衬底上的光致抗蚀剂上。 用于相移焦点监视器的照相掩模具有彼此相邻的第一和第二透光部分，同时夹着屏蔽图案，并且被构造成使得在通过第一透光部分的曝光光与第一透光部分之间发生180度以外的相位差 曝光光通过第二透光部。 因此，可以实现在z方向上具有高检测灵敏度并且不需要改变照明孔径的聚焦监视方法，聚焦监视系统和半导体制造方法。

公开(公告)号：US09781836B2

公开(公告)日：2017-10-03

申请号：US13499928

申请日：2010-10-05

申请人： Iori Hukushima ,  Tomohiro Hirata ,  Hidekazu Kondou ,  Susumu Kaneko ,  Satoshi Uehara ,  Yuki Miyamoto

发明人： Iori Hukushima ,  Tomohiro Hirata ,  Hidekazu Kondou ,  Susumu Kaneko ,  Satoshi Uehara ,  Yuki Miyamoto

IPC分类号： H05K1/03 ,  H05K3/28 ,  C08G18/00 ,  C08G18/08 ,  C08G18/12 ,  C08G18/32 ,  C08G18/34 ,  C08G18/40 ,  C08G18/44 ,  C08G18/64 ,  C08G18/65 ,  C08G18/66 ,  C08G18/75 ,  C08G18/76 ,  C08G18/80 ,  C08G18/82 ,  C08J3/24 ,  C08K5/00 ,  C08L75/00 ,  C08L75/04

CPC分类号： H05K3/285 ,  C08G18/00 ,  C08G18/0823 ,  C08G18/12 ,  C08G18/3212 ,  C08G18/348 ,  C08G18/4081 ,  C08G18/44 ,  C08G18/6438 ,  C08G18/65 ,  C08G18/6588 ,  C08G18/66 ,  C08G18/6633 ,  C08G18/664 ,  C08G18/758 ,  C08G18/7607 ,  C08G18/8061 ,  C08G18/82 ,  C08J3/24 ,  C08J2375/04 ,  C08K5/0025 ,  C08L75/00 ,  C08L75/04 ,  C08L2203/206 ,  C08L2312/00 ,  H05K1/0393 ,  C08G18/345

摘要： A thermosetting resin composition which contains a polyurethane resin and a curing agent, the polyurethane resin including a constitutional unit derived from an alicyclic diol and having an acid value of 10 to 35 mgKOH/g.

公开(公告)号：US09086116B2

公开(公告)日：2015-07-21

申请号：US13813050

申请日：2011-07-28

申请人： Tomohiro Saeki ,  Satoshi Nakagaito ,  Hiroaki Suezaki ,  Yuki Miyamoto

发明人： Tomohiro Saeki ,  Satoshi Nakagaito ,  Hiroaki Suezaki ,  Yuki Miyamoto

IPC分类号： F16F15/12 ,  F16F15/315 ,  F16F15/139 ,  B60K6/445 ,  F16D1/10 ,  F16D3/14

CPC分类号： F16F15/3153 ,  B60K6/445 ,  B60Y2400/48 ,  F16D1/10 ,  F16D3/14 ,  F16D2001/103 ,  F16F15/1395 ,  Y02T10/6204 ,  Y02T10/6239 ,  Y10T74/2121

摘要： A damper device comprises: a first shaft that outputs rotational power from a power source; a second shaft that transmits rotational power to a gear mechanism and has outer splines; a first rotational member(s) to which the rotational power of the first shaft is transmitted; a second rotational member spline-engaged with the outer splines; a damper unit that absorbs torque fluctuation between the first and second rotational members; and an inertial body having inner splines spline-engaged with the outer splines and having an annular portion. The tooth parts of the inner splines are pressed into contact with the tooth parts of the outer splines in the circumferential direction of the inertial body.

摘要翻译： 阻尼装置包括：从电源输出旋转动力的第一轴; 第二轴，其将旋转动力传递到齿轮机构并具有外花键; 传送第一轴的旋转动力的第一旋转构件; 与所述外花键花键接合的第二旋转构件; 阻尼单元，其吸收第一和第二旋转构件之间的扭矩波动; 以及具有与外花键花键接合并具有环形部分的内花键的惯性体。 内花键的齿部在惯性体的圆周方向上与外花键的齿部部分压接。

公开(公告)号：US20120037336A1

公开(公告)日：2012-02-16

申请号：US13258252

申请日：2009-05-07

申请人： Masahide Ishikawa ,  Kaname Uzuki ,  Atsushi Morita ,  Keiko Tanaka ,  Yuki Miyamoto ,  Satoru Shiga ,  Masaki Morita ,  Miyuki Matsuda ,  Manabu Orihashi ,  Yoshihiro Saeki ,  Keiichi Uno ,  Hiroki Nishimura ,  Takayuki Kumamoto

发明人： Masahide Ishikawa ,  Kaname Uzuki ,  Atsushi Morita ,  Keiko Tanaka ,  Yuki Miyamoto ,  Satoru Shiga ,  Masaki Morita ,  Miyuki Matsuda ,  Manabu Orihashi ,  Yoshihiro Saeki ,  Keiichi Uno ,  Hiroki Nishimura ,  Takayuki Kumamoto

IPC分类号： F01P9/00

CPC分类号： B60H1/08 ,  B60H1/00314 ,  F01P2060/16 ,  F02B29/0493 ,  F02M26/33 ,  F02N19/04 ,  F16H57/0413 ,  Y02T10/146 ,  Y02T10/16 ,  Y10T477/653

摘要： When there is an extremely low ambient temperature, an electronic control unit controls operation of a circulation path for coolant water in such a manner that, after starting of an engine, the coolant water is supplied from the engine first to a throttle valve and an EGR valve and then to an oil warmer for a transmission. This solves a failure problem in the throttle valve and the EGR valve caused by frost formation at an early stage. As a result, desired operating performance of the vehicle is quickly ensured and heat management in the vehicle is carried out in a desired manner when there is an extremely low ambient temperature.

摘要翻译： 当环境温度非常低时，电子控制单元控制冷却水循环路径的操作，使得在发动机启动之后，冷却水从发动机首先供应到节流阀和EGR 阀门，然后到油加热器进行传动。 这解决了在早期阶段由于霜冻形成引起的节流阀和EGR阀的故障问题。 结果，当环境温度极低时，能够快速确保车辆的期望的操作性能，并且以期望的方式进行车辆的热管理。

公开(公告)号：US20110098119A1

公开(公告)日：2011-04-28

申请号：US12912213

申请日：2010-10-26

申请人： Tomohiro Saeki ,  Masanori Suzuki ,  Yuki Miyamoto ,  Atsushi Yamazumi ,  Masaki Kato ,  Hiroyuki Yamamoto ,  Toshiyuki Saburi ,  Ryota Akada

发明人： Tomohiro Saeki ,  Masanori Suzuki ,  Yuki Miyamoto ,  Atsushi Yamazumi ,  Masaki Kato ,  Hiroyuki Yamamoto ,  Toshiyuki Saburi ,  Ryota Akada

IPC分类号： F16D7/02

CPC分类号： F16F15/129 ,  F16F2230/02

摘要： A torque fluctuation absorbing apparatus includes a first plate member, a second plate member rotatable relative to the first plate member, and a first friction member disposed between the first plate member and the second plate member and pressed against the first plate member in a slidable manner. The second plate member includes a first retaining surface that makes contact with the first friction member. The first friction member includes a plurality of grooves at a surface facing the first retaining surface of the second plate member, the grooves extending in a radial direction of the first friction member.

摘要翻译： 扭矩波动吸收装置包括第一板构件，可相对于第一板构件旋转的第二板构件和设置在第一板构件和第二板构件之间的第一摩擦构件，并以可滑动的方式压靠第一板构件 。 第二板构件包括与第一摩擦构件接触的第一保持面。 第一摩擦构件包括在面向第二板构件的第一保持面的表面处的多个槽，所述槽沿第一摩擦构件的径向方向延伸。

公开(公告)号：US20130125700A1

公开(公告)日：2013-05-23

申请号：US13813050

申请日：2011-07-28

申请人： Tomohiro Saeki ,  Satoshi Nakagaito ,  Hiroaki Suezaki ,  Yuki Miyamoto

发明人： Tomohiro Saeki ,  Satoshi Nakagaito ,  Hiroaki Suezaki ,  Yuki Miyamoto

IPC分类号： F16F15/315

CPC分类号： F16F15/3153 ,  B60K6/445 ,  B60Y2400/48 ,  F16D1/10 ,  F16D3/14 ,  F16D2001/103 ,  F16F15/1395 ,  Y02T10/6204 ,  Y02T10/6239 ,  Y10T74/2121

摘要： A damper device comprises: a first shaft that outputs rotational power from a power source; a second shaft that transmits rotational power to a gear mechanism and has outer splines; a first rotational member(s) to which the rotational power of the first shaft is transmitted; a second rotational member spline-engaged with the outer splines; a damper unit that absorbs torque fluctuation between the first and second rotational members; and an inertial body having inner splines spline-engaged with the outer splines and having an annular portion. The tooth parts of the inner splines are pressed into contact with the tooth parts of the outer splines in the circumferential direction of the inertial body.

摘要翻译： 阻尼装置包括：从电源输出旋转动力的第一轴; 第二轴，其将旋转动力传递到齿轮机构并具有外花键; 传送第一轴的旋转动力的第一旋转构件; 与所述外花键花键接合的第二旋转构件; 阻尼单元，其吸收第一和第二旋转构件之间的扭矩波动; 以及具有与外花键花键接合并具有环形部分的内花键的惯性体。 内花键的齿部在惯性体的圆周方向上与外花键的齿部部分压接。